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Gainp/gaas/inganas/ge four-junction solar cell and preparation method thereof

A technology of solar cells and sub-cells, applied in the field of solar cells, can solve problems affecting cell conversion efficiency, complex buffer layer growth technology, shortage of Ge materials, etc., and achieve the effects of improving cell efficiency, reducing cost and resource consumption, and reducing consumption

Active Publication Date: 2016-04-27
SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When GaInP / InGaAs / InGaNAs / Ge four-junction cells are grown on Ge substrates, reverse domains will be generated in the epitaxial layer when polar III-V semiconductor materials are grown on non-polar Ge substrates, which will affect the conversion efficiency of cells. ; In order to reduce the reverse domain density, a more complex buffer layer growth technique is required
At the same time, mass production of Ge-based triple-junction or quadruple-junction solar cells will cause a shortage of Ge materials.

Method used

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  • Gainp/gaas/inganas/ge four-junction solar cell and preparation method thereof
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  • Gainp/gaas/inganas/ge four-junction solar cell and preparation method thereof

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no. 1 Embodiment approach

[0026] figure 1 Shown is a structural diagram of a GaInP / GaAs / InGaNAs / Ge four-junction solar cell provided in this specific embodiment.

[0027] This specific embodiment provides a GaInP / GaAs / InGaNAs / Ge four-junction solar cell, the bandgap combination is 1.90eV / 1.42eV / 1.00eV / 0.67eV, and the GaInP / GaAs / InGaNAs / Ge four-junction solar cell includes Si supporting substrate 41, and first contact layer 32 of Ge or GaInAs, Ge subcell 40, first tunnel junction 39, InGaNAs subcell 38, second tunneling junction arranged in sequence on the surface of said Si supporting substrate 41 Junction 37, GaAs subcell 36, third tunnel junction 35, GaInP subcell 34 and second contact layer 03 of InGaAs or GaAs.

[0028] As an optional implementation mode, the thickness of the second contact layer 03 of InGaAs or GaAs is in the range of 300nm to 700nm, and the doping concentration is greater than 2.0E18cm -3 .

[0029] 2.0E18cm appears in the application documents -3 Indicates 2.0×10 18 cm -3 ...

no. 2 Embodiment approach

[0046] This specific embodiment provides a method for preparing a GaInP / GaAs / InGaNAs / Ge four-junction solar cell. The bandgap combination of the solar cell is 1.90eV / 1.42eV / 1.00eV / 0.67eV, and each layer of the GaInP / GaAs / InGaNAs / Ge four-junction cell in the above manufacturing method is grown by MOCVD or MBE. If the MOCVD method is used, the N-type dopant atoms are Si, Se, S or Te, and the P-type dopant atoms are Zn, Mg or C; if the MBE method is used, the N-type dopant atoms are Si, Se, S, Sn or Te, P-type dopant atoms are Be, Mg or C.

[0047] Figure 4 It is a flow chart of the steps of the GaInP / GaAs / InGaNAs / Ge four-junction solar cell provided in this specific embodiment.

[0048] Described preparation method comprises:

[0049] Step S401, providing a GaAs substrate;

[0050] Step S402, growing the second contact layer, the GaInP sub-cell, the third tunnel junction, the GaAs sub-cell, the second tunnel junction, the InGaNAs sub-cell, the first tunnel junction, the Ge ...

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Abstract

The invention provides a GaInP / GaAs / InGaNAs / Ge four-junction solar cell, comprising a Si support substrate, wherein a first contact layer of Ge or GaInAs, a Ge sub cell, a first tunnel junction, an InGaNAs sub cell, a second tunnel junction, a GaAs sub cell, a third tunnel junction, a GaInP sub cell and a second contact layer of InGaNAs or GaAs are arranged on the surface of the Si support substrate in sequence. The invention also provides a preparation method of the GaInP / GaAs / InGaNAs / Ge four-junction solar cell. The preparation method comprises the following steps: 1, a GaAs substrate is provided; 2, the second contact layer, the GaInP sub cell, the third tunnel junction, the GaAs sub cell, the second tunnel junction, the InGaNAs sub cell, the first tunnel junction, the Ge sub cell and the first contact layer are grown on the surface of the GaAs substrate in sequence; 3, the Si support substrate is provided; 4, the Si support substrate is bonded to the surface of the first contact layer; and 5, the GaAs substrate is stripped from the second contact layer, so that the GaAs substrate is removed.

Description

technical field [0001] The invention relates to the field of solar cells, in particular to a GaInP / GaAs / InGaNAs / Ge four-junction solar cell and a preparation method thereof. Background technique [0002] In the field of solar cells, how to fully absorb the full spectrum of the sun, improve the generation efficiency of photogenerated carriers, and promote the separation of electrons and holes has always been the core key issue in improving the efficiency of solar cells. The current structural design of solar cells is basically based on the following two considerations: one is to give priority to lattice matching and put photocurrent matching in a secondary position. However, due to its determined bandgap energy, the lattice-matched cell structure limits the photocurrent matching of solar cells, making it impossible to realize full-spectrum absorption and utilization of sunlight. The GaInP / GaAs / Ge triple-junction solar cell is the most researched and technically mature system...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/0687H01L31/18
CPCY02E10/544Y02P70/50
Inventor 赵勇明董建荣李奎龙孙玉润于淑珍杨辉
Owner SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
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