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Atmospheric-pressure plasma generation device

An atmospheric pressure plasma and generating device technology, applied in the direction of plasma, etc., can solve the problem of increasing plasma power consumption, and achieve the effect of reducing power consumption, reducing the possibility of local streamer and gas leakage, and reducing the area

Inactive Publication Date: 2012-12-05
株式会社BIEMT
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Because of the face-to-face adjoining, the electrode area is larger, and the power consumption required for plasma generation is increased.
[0008] In addition, under the same power condition, the larger the electrode area, the less ionized gas, the greater the possibility of local streamer or gas leakage.

Method used

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Embodiment Construction

[0026] Fig. 2 is the perspective view of the atmospheric pressure plasma generation device of the embodiment of the present invention; Fig. 3 is the side view of the atmospheric pressure plasma generation device of the embodiment of the present invention; Fig. 4 is an exploded perspective view of one direction of the atmospheric pressure plasma generation device of the embodiment of the present invention; Fig. 5 is an exploded perspective view in another direction of the atmospheric pressure plasma generator of the embodiment of the present invention; FIG. 6 is a cross-sectional view along the A-A direction of FIG. 2; FIG. Solid state combined with cover parts Figure 1 ; Figure 7(b) is a three-dimensional view of the combined state of the segmented radio frequency electrode and the covering member in the atmospheric pressure plasma generator according to the embodiment of the present invention Figure II .

[0027] As shown in Fig. 2 to Fig. 7(b), the atmospheric pressure pla...

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Abstract

The invention relates to an atmospheric-pressure plasma generation device. The atmospheric-pressure plasma generation device comprises a shell, grounding electrode parts, an insulating part, a segmented radio-frequency electrode, and a power supply part, wherein the grounding electrode parts are combined with the lower part of the shell, the lower parts of the grounding electrode parts are provided with plasma discharge ports; the insulating part is combined between the shell and the grounding electrode parts; the segmented radio-frequency electrode is combined with the lower part of the insulating part, is separated from the grounding electrode parts and forms a discharge space between the grounding electrode parts; and the power supply part is used for supplying power to the segmented radio-frequency electrode. The segmented radio-frequency electrode is cylinder and is arranged on the upper parts of the discharge ports; and discharge faces of the grounding electrode parts are rectangular, are adjacently opposite to the segmented radio-frequency electrode and form the discharge space, gas supplied by the upper part of the discharge space discharges in the discharge space defined by the arc-shaped segmented radio-frequency electrode and the rectangular discharge faces, and plasma is injected through the discharge ports.

Description

technical field [0001] The present invention relates to an atmospheric pressure plasma generating device, in particular to an atmospheric pressure plasma generating device that provides stable low-temperature glow discharge plasma under atmospheric pressure and uses cylindrical segmented radio frequency electrodes to reduce power consumption for generating plasma under atmospheric pressure. device. Background technique [0002] Existing vacuum systems do not require atmospheric pressure plasma, and at atmospheric pressure, the chamberless chamber can also be used in existing production lines for continuous processing. In order to generate atmospheric pressure plasma, there are mainly the following technologies: dielectric barrier discharge, corona discharge, microwave discharge and arc discharge. [0003] The above-mentioned technologies are widely used in many industrial fields. Except for arc discharge, other technologies are mostly used in semiconductor manufacturing ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/46
Inventor 朴钟仁
Owner 株式会社BIEMT
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