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Cleaning method for furnace tube for diffusion

A diffusion furnace and furnace tube technology, applied in cleaning methods and appliances, chemical instruments and methods, cleaning hollow objects, etc., can solve the problems of complex cleaning process steps for diffusion furnace tubes, and achieve the effect of saving time

Active Publication Date: 2014-12-24
YINGLI ENERGY CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The present invention aims to provide a method for cleaning the furnace tube for diffusion, so as to solve the technical problem of complex cleaning process steps for the furnace tube for diffusion in the prior art

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] 1) Raise the temperature in the furnace tube to 900°C, pass oxygen, nitrogen, and nitrogen carrying phosphorus oxychloride into the furnace tube to clean the furnace tube, and keep it for 30 minutes; among them, the volume ratio of nitrogen, nitrogen with source, and oxygen At 150:1:1; the oxygen flow rate is 0.1slm;

[0029] 2) Stop feeding the gas, complete the cleaning, and lower the temperature in the furnace tube to 750°C.

Embodiment 2

[0031] 1) Raise the temperature in the furnace tube to 960°C, pass oxygen, nitrogen, and nitrogen carrying phosphorus oxychloride into the furnace tube to clean the furnace tube, and keep it for 30 minutes; among them, the volume of nitrogen, nitrogen with source, and oxygen The ratio is 5:1:1; the oxygen flow rate is 1slm;

[0032] 2) Stop feeding the gas, complete the cleaning, and lower the temperature in the furnace tube to 850°C.

Embodiment 3

[0034] 1) Raise the temperature in the furnace tube to 940°C, pass oxygen, nitrogen, and nitrogen carrying phosphorus oxychloride into the furnace tube to clean the furnace tube, and keep it for 180 minutes; among them, the volume of nitrogen, nitrogen with source, and oxygen The ratio is 100:1:1; the flow rate of oxygen is 0.1slm;

[0035] 2) Stop feeding the gas, complete the cleaning, and lower the temperature in the furnace tube to 800°C.

[0036] Using the method in Examples 1-3, the furnace tube is cleaned once every 30-180 days, which can reduce the unqualified yield of silicon wafers caused by metal ion pollution of the furnace tube by 0.1%.

[0037] In summary, adopting the technical solution of the present invention has the following beneficial effects:

[0038] 1) Online cleaning of furnace tubes can be realized without modification of equipment, which is simple and practical. This method can be used for cleaning furnace tubes after long-term use, and can also be u...

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PUM

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Abstract

The invention discloses a cleaning method for a furnace tube for diffusion. The method comprises the following steps of: (1) introducing nitrogen, source-carrying nitrogen and oxygen into the furnace tube for diffusion according to the volume ratio of 150: 1: 1-5: 1: 1, and continuing for above 30 minutes, wherein chloride ions are contained in the source-carrying nitrogen; and (2) stopping the introduction of the nitrogen, the source-carrying nitrogen and the oxygen, and completing cleaning. According to the technical scheme applying the cleaning method disclosed by the invention, Cl- is adopted for cleaning the furnace tube for diffusion, the chloride ions are very easy to be combined with metal ions, the metal ions can be taken out of the furnace tube after combination, then the metal ions of the furnace tube can be cleaned, the disassembly of the furnace tube is not required, and the furnace tube (quartz device) can be prevented from being damaged during the disassembly process.

Description

technical field [0001] The invention relates to the technical field of solar cell preparation, in particular to a method for cleaning a diffusion furnace tube. Background technique [0002] During the production of solar cells, metal ions floating in the air will enter the furnace tube along with the silicon wafers entering and leaving the furnace tube. The accumulation of metal ions in the furnace tube will have a serious impact on the silicon wafer, and have a significant impact on the production efficiency and battery quality of the battery. Therefore, the furnace tube needs to be cleaned after a period of use. Common cleaning method in the prior art has following two kinds: [0003] 1. Clean the furnace tube through the reaction of dichlorethylene and oxygen at high temperature to produce chloride ions. However, when this method is used, if oxygen cannot be introduced into the furnace tube in time, high-temperature carbonization of dichlorethylene will occur, and black ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B9/027
Inventor 崔景光马继奎刘旭赵易坤
Owner YINGLI ENERGY CHINA