Mask plate and method for composing a picture with same

A mask and mask pattern technology, applied in the field of mask, can solve the problems of high manufacturing cost and inability to design an infinite exposure machine, etc.

Active Publication Date: 2013-04-10
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, the size of the existing glass substrate can be 2200*2500mm, but due to the limitation of the exposure area of ​​the exposure machine, a color filter substrate with a maximum size of 1120*1300mm can be formed after one exposure
[0003] According to the traditional method, in order to realize

Method used

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  • Mask plate and method for composing a picture with same
  • Mask plate and method for composing a picture with same
  • Mask plate and method for composing a picture with same

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Embodiment Construction

[0042] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments.

[0043] Reference figure 1 , The embodiment of the present invention provides a mask 1 including at least one mask unit group 10, each of the mask unit groups 10 is a row, including a first mask unit 101 at one end, and a first mask unit 101 at another One second mask unit 102 at one end, and at least one third mask unit 103 located between the two ends;

[0044] Each of the mask units is provided with a mask pattern; the mask pattern of each of the mask units includes a plurality of tiny patterns and voids under the outline of the mask pattern on the side close to the adjacent mask unit, And the mask patterns of the two adjacent mask units ma...

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Abstract

The invention provides a mask plate and a method for composing a picture with the same, and the mask plate and the method relate to the technical field of displaying and solve the problem of the prior art that no color film substrate with a large size can be manufactured. The mask plate comprises at least one mask unit group; each mask unit group form a row, and comprises a first mask unit which is arranged on one end, a second mask unit which is arranged on the other end, and at least one third mask unit which is arranged between the two ends; each mask unit is provided with a mask pattern; the mask pattern of each mask unit comprises a plurality of micro patterns and gaps on one side which is close to the adjacent mask unit and below the outline of the mask pattern; and the micro patterns and the gaps of the mask patterns of the two adjacent mask units on two sides which are close to each other are mutually matched. The mask plate and the method for composing the picture with the same are applicable to the field of the manufacturing of liquid crystal display devices.

Description

Technical field [0001] The present invention relates to the field of display technology, in particular to a mask and a method for patterning using the mask. Background technique [0002] In the prior art, a black matrix film layer, a color film layer, a protective film layer and a spacer film layer are formed on a color filter substrate. The black matrix film layer includes a black matrix pattern; the color film layer includes a pixel pattern; and the spacer film layer includes a spacer. The black matrix pattern, the pixel pattern and the spacer must pass through one exposure during the formation process, but due to the limitation of the exposure size of the exposure machine, only a certain size of pattern can be formed after one exposure. If you want to make a larger size color filter substrate, the pixel pattern and the spacers, because they are not integrated, can be completed by multiple exposures. However, the black matrix is ​​integrated, and there are splicing seams betw...

Claims

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Application Information

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IPC IPC(8): G02F1/1335G03F1/00G03F7/20
Inventor 许志军齐勤瑞肖洋王恒英
Owner BOE TECH GRP CO LTD
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