Unlock instant, AI-driven research and patent intelligence for your innovation.

Dustproof film assembly receiving container

A technology of dust-proof film components and storage containers, which is applied in the direction of instruments, electrical components, and originals for photomechanical processing, etc., which can solve the problems of dust hazards, poor reliability, and difficulties, and achieve less risk of foreign matter adhesion and simple Structure, anti-shedding effect

Active Publication Date: 2014-11-26
SHIN ETSU CHEM IND CO LTD
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the needle is fixed by a combination device such as a screw, the needle can be fixed securely, but there is a risk of dust generation.
In addition, when the needle is roughly tapered and fixed by friction force, it is difficult to adjust the friction force to an appropriate level, and the reliability is poor.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Dustproof film assembly receiving container
  • Dustproof film assembly receiving container
  • Dustproof film assembly receiving container

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0058] Hereinafter, examples of the present invention will be described in detail, but the scope of the present invention is not limited by these examples.

Embodiment 1）

[0060] Manufactured by vacuum forming with antistatic ABS resin sheet figure 1 The container body 12 and the cover body 14 of the shown shape. The container body 12 and the cover body 14 are fitted and locked at the peripheral edge to form a figure 1 The pellicle storage container 10 is shown. Openings 14 a are formed at four places near corners in the longitudinal direction of the cover body 14 . The size of the dust-proof film assembly storage container 10 is 1005×937 mm in shape and 70 mm in height. The sheets used for molding are transparent 5 mm for the lid body 14 and black 5 mm for the container body 12

[0061] Further, by injection molding, with ABS resin, the Figure 5 represents the needle mounting part 32 and is prepared with PPS resin, Figure 4 Pin 28 shown. The needle 28 is formed by a front end portion 28a, a middle portion 28b, and a rear end portion 28c. Between the middle portion 28b and the rear end portion 28c, a protrusion 30 constituting a holding ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

PURPOSE: A pellicle container is provided to prevent impurity attachment to the pellicle by covering pellicle fixed to a container body, with a covering material, thereby authentically maintain the fixed state in transit. CONSTITUTION: A pellicle container consists of a container body(12) accommodating a pellicle(16) and a covering material(14) covering a pellicle. A pellicle fixing part is installed in the container body(18). The pellicle fixing part comprises a pin(28) which is rotatable by inserting a front end into a concave part(26) of a pellicle frame(16a); a pin mount part(32); and an opening(14a) which is formed in the covering material to rotate the pin in the pin mounting part; and a closing plate(40) of the opening. A protrusion and the notch part are located in the pin mounting part, for fixing the pin.

Description

technical field [0001] The present invention relates to storing a pellicle in a pellicle container in which a pellicle is attached to a pellicle frame and is used in the manufacture of semiconductor components, printed circuit boards, or liquid crystal display devices. Background technique [0002] In the manufacture of semiconductors such as LSI and super LSI, and the manufacture of liquid crystal display devices, etc., photolithography is performed to create a pattern by irradiating a semiconductor wafer or an original plate for liquid crystal with light. At this time, if dust adheres to the photomask or reticle, the dust absorbs the light and bends the light, thereby deforming the transferred pattern, causing uneven edges, and blackening of the base. . The above work is usually performed in a clean room. Even so, it is difficult to keep the photomask clean all the time. Therefore, a pellicle in which a transparent pellicle is attached to a pellicle frame is used. In thi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/66
CPCG03F1/66H01L21/0273H01L21/6735
Inventor 关原一敏
Owner SHIN ETSU CHEM IND CO LTD