Cleaning apparatus of ion source extraction electrode system

Abstract

The present invention provides a cleaning apparatus of an ion source extraction electrode system, which can eliminate deposit in high speed along a wide area that form a leading-out electrode system of an ion source. The cleaning apparatus comprises the following components: a cleaning gas source (42) which supplies cleaning gas (48) between two opposite electrodes (11,12) of a leading-out electrode system (10), thereby keeping the gas pressure between the two electrodes to a gas pressure for generating glow discharge; and a glow discharge power supply (60) which applies DC voltage between the electrodes (11,12) for generating glow discharge (80). The cleaning apparatus further comprises the following components: an abnormal discharge measurer (84) which measures times (N) of abnormal discharge between the the electrodes (11,12) in preset time; and a power supply controller (86) which controls through the measured time (N) of abnormal discharge for increasing or reducing the output current of the glow discharge power supply (60) for a preset amplitude.

Description

technical field [0001] The present invention relates to a cleaning device for cleaning two electrodes facing each other among a plurality of electrodes constituting an extraction electrode system of an ion source when an ion beam is not extracted from the ion source. In addition, in this specification, when it abbreviates as an ion, it means a positive ion. Background technique [0002] If the operation of extracting the ion beam from the ion source continues, deposits are deposited (attached) on the electrodes constituting the extraction electrode system. If left unchecked, it will cause problems such as abnormal discharge between electrodes. [0003] Therefore, as an example of a technique for cleaning the ion source electrode, the following cleaning technique has been proposed in the past: instead of supplying an ionizable gas into the plasma chamber of the ion source, a rare gas is supplied, and an ion beam of the rare gas is extracted, Furthermore, by adjusting the ga...

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Problems solved by technology

[0006] In addition, since the ion beam is extracted from the plasma in the plasma chamber of the ion source, the upper limit of the ion beam current irradiated to each electrode is in principle the maximum ion beam current level of the ion source, so it can only reach several hundred at most. around mA, making it difficult to remove deposits at high speed

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