Magnetic levitation wafer rotary system
A magnetic levitation and wafer technology, applied in the direction of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., to achieve the effects of no lubrication, low energy consumption, and stable performance
Active Publication Date: 2015-06-17
SHENYANG KINGSEMI CO LTD
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Problems solved by technology
[0003] In order to solve the problem of relative rotational movement with the wafer existing in the existing sealing system, the object of the present invention is to provide a magnetic levitation wafer rotation system using magnetic fluid
Method used
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Embodiment Construction
[0015] The present invention will be described in further detail below in conjunction with the accompanying drawings.
[0016] Such as figure 1 As shown, the present invention includes an upper cover support frame 1, an upper cover 2, a position sensor 5, a magnetic fluid bearing 6, a hollow electromagnet 7, a lower cavity 9 and a driving motor 10, wherein the driving motor 10 is installed on a workbench, and drives The output end of the motor 10 is connected with a lower cavity 9, the lower cavity 9 is a disc with a circular groove inside; a vacuum chuck 4 is arranged in the middle of the lower cavity 9, and a wafer 3 is adsorbed on the vacuum chuck 4, The wafer 3 and the vacuum chuck 4 rotate together with the lower cavity 9 . Described loam cake support frame 1 is made of two mutually vertical straight plates, and one end of loam cake support frame 1 is connected to the output end of the drive device (drive device can be cylinder) that is installed on the workbench frame, ...
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The invention belongs to the field of semiconductor devices, and particularly relates to a magnetic levitation wafer rotary system by utilizing magneto fluid. The magnetic levitation wafer rotary system comprises an elevated upper cover carriage, an upper cover, a magneto fluid bearing, a lower chamber and a drive motor installed on the workbench. The output end of the drive motor is connected with the lower chamber and the lower chamber rotates through the drive motor. A vacuum chuck is installed inside the lower chamber, and the vacuum chuck is provided with the wafer. The wafer and the vacuum rotate with the lower chamber. One end of the upper cover carriage is connected with the drive motor and the other end is connected with the upper cover which is located above the lower chamber through the magneto fluid bearing. The upper cover goes up and down with the upper cover carriage. The floor level of the upper cover is connected with the lower chamber in a sealed mode to form a sealed chamber which rotates synchronously with the lower chamber through the frictional force. The weight of the upper cover is fixed on the orbit and the upper cover has no force on the lower chamber. The upper cover and the lower chamber rotate synchronously avoiding the problem of the relative rotation of the wafer and the rotary system.
Description
technical field [0001] The invention belongs to the field of semiconductor equipment, in particular to a magnetic levitation wafer rotation system utilizing magnetic fluid, and the rotation system is a sealed chamber where the wafer process is processed. The present invention is mostly used in coating equipment for semiconductor manufacturing processes, and is especially suitable for the coating process of easily volatilized chemicals such as photoresist and solder resist. Background technique [0002] At present, with the diversification of semiconductor manufacturing processes, many processes in the equipment are becoming more and more complicated, and the requirements for the state of the wafers in the manufacturing process are becoming more and more cumbersome. There are many processes that require the wafers to achieve high-speed rotation in a sealed system; In addition, the sealing system and the wafer need to rotate synchronously to prevent the influence of the air fl...
Claims
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IPC IPC(8): H01L21/687
Inventor 汪明波
Owner SHENYANG KINGSEMI CO LTD