[Object] It is an object of the invention to provide a cleaning apparatus for cleaning a precision substrate capable of preventing a contamination factor from adhering again, to prevent a natural oxide film from being formed, and to prevent a water mark.
[Solving Means] In a cleaning apparatus 1, a substrate-to-be-cleaned 2 is disposed in a container 3, and an atmosphere component measuring device 4 which measures an atmosphere in the container 3, gas supply means 5 for controlling an atmosphere, and gas discharge means 6 and 7 are disposed in the cleaning apparatus 1, the cleaning apparatus 1 includes at least one the gas supply means 5 which equally supplies gas from a portion opposed to a surface-to-be-cleaned, gas supply means 21 for supplying gas to a rotating/holding mechanism comprising a cylindrical stationary shaft 16, a fluid bearing 17 and a rotation support member 18, gas discharge means 7 for discharging gas into a drainage mechanism, and gas supply means 31 for supplying gas for controlling an atmosphere when cleaning liquid is injected. The atmosphere component measuring device 4 which measures the atmosphere in the cleaning apparatus 1 can measure at any timing, and can detect one or more of a flammable component, a combustible component and a oxdizer component.