Support Apparatus, Stage Apparatus, Exposure Apparatus, And Device Manufacturing Method

a technology of supporting apparatus and cylinder, which is applied in the direction of photomechanical apparatus, instruments, printing, etc., can solve the problems of insufficient response to the movement of the cylinder in the z direction, and achieve the effect of improving the stiffness of the fluid bearing formed quick change of the attitude of the supported member, and improving the response to a bias between the cylinder portion and the cylinder portion

Inactive Publication Date: 2008-01-17
NIKON CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

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Benefits of technology

[0029] Response to a bias to the supported member by the piston portion and the cylinder portion can be improved. Therefore, the position in the direction of gravitational force and the attitude of the supported member can be swiftly changed. Furthermore, stiffness of a fluid bearing formed between the cylinder portion and the piston portion can be improved with ease. Therefore, a relative movement between the piston portion and th

Problems solved by technology

However, this support unit has problems of, for example, insufficient response to the movement of the cylinder in the Z direction, etc., si

Method used

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  • Support Apparatus, Stage Apparatus, Exposure Apparatus, And Device Manufacturing Method
  • Support Apparatus, Stage Apparatus, Exposure Apparatus, And Device Manufacturing Method
  • Support Apparatus, Stage Apparatus, Exposure Apparatus, And Device Manufacturing Method

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Embodiment Construction

[0042] The following is a description of embodiments of a support apparatus, a stage apparatus, an exposure apparatus, and a device manufacturing method according to the present invention with reference to the drawings.

[0043]FIG. 1 is a schematic block diagram of an embodiment of an exposure apparatus according to the present invention.

[0044] The exposure apparatus EX is a step-and-scan type scanning exposure apparatus that while synchronously moving a reticle (mask) R and a wafer (substrate) W in a one-dimensional direction, transfers a pattern PA formed on the reticle R onto each shot region on the wafer W via a projection optical system 30, that is, also known as a scanning stepper.

[0045] The exposure apparatus EX includes: an illumination optical system 10 that illuminates the reticle R with an exposure light EL; a reticle stage 20 that holds the reticle R; a projection optical system 30 that projects the exposure light EL radiated from the reticle R onto the wafer W; and a w...

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PUM

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Abstract

A support apparatus, a stage apparatus, an exposure apparatus, etc. are proposed that can increase response of a relative movement between a piston and a cylinder, etc. are proposed. There is provided a support apparatus including: a cylinder portion; a piston portion that is provided inside the cylinder portion and is movable in a Z direction; a fluid bearing formed in at least a portion between an inner wall of the cylinder portion and an outer wall of the piston portion, the support apparatus supporting a supported member in the Z direction with respect to a support member by means of a biasing force generated by the cylinder portion and the piston portion, in which fluids are supplied independently inside the fluid bearing and the cylinder.

Description

TECHNICAL FIELD [0001] The present invention relates to a support apparatus that supports an object, a stage apparatus that supports the support apparatus, and an exposure apparatus provided with the stage apparatus etc. [0002] This application claims priority to Japanese Patent Application No. 2004-215434, filed Jul. 23, 2004, the contents of which are incorporated herein by reference. BACKGROUND ART [0003] In the photolithography process for manufacturing semiconductor devices, liquid crystal display devices, etc., a step-and-repeat type reduction projection exposure apparatus (also known as a stepper) in which a pattern formed on a mask or reticle (hereinafter generally referred to as a reticle) is projected via a projection optical system onto a photosensitive object such as a wafer or glass plate coated with a resist, etc. (hereinafter generally referred to as a wafer); and a step-and-scan type scanning exposure apparatus (also known as a scanning stepper) that is a modified ve...

Claims

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Application Information

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IPC IPC(8): G03B27/42
CPCF16C29/025F16C32/06F16C32/0603G12B5/00G03F7/70758G03F7/70816G03F7/70716F16C32/0614G03F7/7085
Inventor ICHINOSE, GOSHIBAZAKI, YUICHI
Owner NIKON CORP
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