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Mask printing plate library for photolithography apparatus, and mask printing plate box placing and taking method thereof

A technology of lithography equipment and access method is applied in the field of access to a reticle library and a reticle box to achieve the effects of reducing complexity, avoiding dumping, and reducing workstations

Active Publication Date: 2013-05-15
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Description
  • Claims
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Problems solved by technology

[0005] In order to overcome the defects in the prior art, the present invention provides a reticle library for lithography equipment. The reticle library is in the form of a cylinder as a whole and can accommodate multiple reticle boxes, avoiding the The complex problem of manipulator control caused by

Method used

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  • Mask printing plate library for photolithography apparatus, and mask printing plate box placing and taking method thereof
  • Mask printing plate library for photolithography apparatus, and mask printing plate box placing and taking method thereof
  • Mask printing plate library for photolithography apparatus, and mask printing plate box placing and taking method thereof

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Embodiment Construction

[0026] A reticle library for lithography equipment according to a specific embodiment of the present invention will be described in detail below with reference to the accompanying drawings. However, the present invention should be understood as not limited to such embodiments described below, and the technical idea of ​​the present invention can be implemented in combination with other known technologies or other technologies having the same functions as those known technologies.

[0027] In the following description, in order to clearly show the structure and working method of the present invention, many directional words will be used to describe, but "front", "rear", "left", "right", "outer", "inner" should be used Words such as ", "outward", "inward", "upper" and "lower" are to be understood as convenient terms, and should not be understood as restrictive terms. In addition, the term "Y direction" used in the following description mainly refers to the direction parallel...

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Abstract

The invention discloses a mask printing plate library for a photolithography apparatus, and a mask printing plate box placing and taking method thereof. The printing mask plate library has a cylinder shape, wherein an intersection position of one of end surfaces and a side surface of the cylinder is provided with a plurality of printing plate box grooves, and the printing plate box groove is provided for accommodating a mask printing plate box and providing a mask printing plate box placing and taking device to place or take out the mask print plate box.

Description

technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to a reticle library for lithography equipment and a method for accessing the reticle box. Background technique [0002] A photolithography machine is a kind of equipment used in the manufacture of integrated circuits. The use of this equipment includes but is not limited to: photolithography equipment for integrated circuit manufacturing, liquid crystal panel photolithography equipment, photomask marking equipment, MEMS (micro-electromechanical systems) / MOMS (micro-optical machine system) lithography equipment, advanced packaging lithography equipment, printed circuit board lithography equipment and printed circuit board processing equipment, etc. [0003] In the current semiconductor photolithography process, a plate library for storing the mask pattern box is required. Such as figure 1 As shown in , most of the plate libraries used in the prior art ar...

Claims

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Application Information

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IPC IPC(8): G03F1/66
Inventor 程吉水单世宝江旭初
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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