Apparatus for producing trichlorosilane

A trichlorosilane, a technology for manufacturing devices, applied in the direction of halosilane, silicon compounds, silicon halide compounds, etc., can solve the problems of easy cracks or cracks, large temperature difference, etc., and achieve the effect of preventing damage

Active Publication Date: 2013-06-05
MITSUBISHI MATERIALS CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, the temperature difference between the inside and outside of the outer chamber, especial

Method used

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  • Apparatus for producing trichlorosilane
  • Apparatus for producing trichlorosilane
  • Apparatus for producing trichlorosilane

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Embodiment Construction

[0023] Hereinafter, embodiments of the trichlorosilane production apparatus according to the present invention will be described with reference to the drawings. Such as figure 1 As shown, the trichlorosilane manufacturing apparatus 100 of the first embodiment includes: a reaction vessel 10, a supply gas containing silicon tetrachloride and hydrogen is supplied inside, and a reaction product gas of trichlorosilane and hydrogen chloride is generated by a conversion reaction; The device 20 is arranged around the reaction vessel 10 and heats the reaction vessel 10 from the outside; the gas supply pipe 30 supplies the supply gas into the reaction vessel 10; the gas outlet pipe 32 leads the reaction product gas from the reaction vessel 10 to the outside; A material 34 covers the reaction vessel 10 and the heater 20; a storage container 36 accommodates the reaction vessel 10, the heater 20 and the heat insulating material 34;

[0024] The components constituting the reaction vessel ...

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Abstract

An apparatus for producing trichlorosilane in which reacted gas including trichlorosilane and hydrogen chloride is produced by heating raw gas including silicon tetrachloride and hydrogen, the apparatus having: a reaction vessel having a substantially cylindrical shape and being provided with a heated wall forming a gas flow-passage along an axis direction; and a heater heating the heated wall, wherein a folding flow-passage is provided at an uppermost stream of the gas flow-passage and has: an inlet flow-passage in which raw gas is introduced; and a turning part connected to a downstream of the inlet flow-passage in which a flow direction of the raw gas is turned at least once in an opposite direction, the turning part is formed between the inlet flow-passage and the heated wall in the folding flow-passage, and a turning length of the folding flow-passage along the axis direction is smaller than a maximum length of the gas flow-passage along the axis direction.

Description

technical field [0001] The invention relates to a trichlorosilane manufacturing device for converting silicon tetrachloride into trichlorosilane. Background technique [0002] Trichlorosilane (SiHCl) used as a raw material for producing high-purity silicon (Si: silicon) 3 ) can be made from silicon tetrachloride (SiCl 4 : silicon tetrachloride) and hydrogen to manufacture. [0003] That is, silicon is produced by the reduction reaction and pyrolysis reaction of trichlorosilane based on the following reaction formulas (1) and (2). Trichlorosilane used in these reactions is produced by a reaction based on the following reaction formula (3). [0004] SiHCl 3 +H 2 →Si+3HCl...(1) [0005] 4SiHCl 3 →Si+3SiCl 4 +2H 2 …(2) [0006] SiCl 4 +H 2 →SiHCl 3 +HCl...(3) [0007] The reaction of the reaction formula (3) is carried out by introducing a supply gas containing silicon tetrachloride and hydrogen into a high-temperature reaction vessel. For example, Paten...

Claims

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Application Information

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IPC IPC(8): C01B33/107
CPCB01J2219/185B01J19/244B01J2219/00135B01J12/00B01J2219/1943B01J2219/00155B01J12/005C01B33/1071
Inventor 三宅政美村上直也
Owner MITSUBISHI MATERIALS CORP
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