Atomic layer deposition device

Abstract

The invention relates to an atomic layer deposition device, and especially relates to an atomic layer deposition device adopting a display-control-integrated embedded control unit as a control system main control part. The atomic layer deposition device comprises the main control part, an electrical control part, a vacuum part, a heating part, and a gas path part. The main control part is respectively connected with the electrical control part, the vacuum part, the heating part, and the gas path part. The electrical control part is respectively connected with the vacuum part, the heating part, and the gas path part. With the main control part, display and control are integrated. According to the invention, the display-control-integrated main control part is used for replacing a traditional display+industrial personal computer+PLC (or control board) control structure, such that the device has the advantages of simple and clear structure, small volume occupation, simple and convenient assembling and maintenance, and high reliability. Also, accidents in device operation process can be effectively prevented.

Description

technical field [0001] The invention relates to an atomic layer deposition device, in particular to an atomic layer deposition device using an embedded control unit integrating display and control as the main control part of the control system. Background technique [0002] Atomic layer deposition (ALD) technology has a unique deposition method (single atomic layer deposited layer by layer at low temperature). It has been greatly improved and is an important technology for preparing High-K materials and optoelectronic thin films. Atomic layer deposition equipment generally needs to run continuously for a long time, and some precursor reactants are flammable and explosive, so high requirements are placed on the reliability of the control system. [0003] The existing atomic layer deposition equipment mostly adopts the control method of display + industrial computer + PLC (or control board), such as figure 1 As shown, in this control method, the three components are indepen...

AI Technical Summary

Problems solved by technology

[0003] The existing atomic layer deposition equipment mostly adopts the control method of display + industrial computer + PLC (or control board), such as figure 1 As shown, in this control method, the three components are independent of each other, and each needs to occupy a certain amount of space, resulting in an increase in the size of the entire device and high cost, and the communication between the industrial computer and the PLC host needs to be completed through a communication protocol. Communication increases the workload of programming and makes the reliability of the system worse. This split design is likely to cause unstable system performance and certain hidden dangers in operation.

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