Test method of residual stress of bridge film structure of micro electro mechanical system

A micro-electromechanical system and residual stress technology, applied in the field of testing, can solve problems such as mechanical structures that are difficult to apply to complex shapes

Active Publication Date: 2013-07-17
TSINGHUA UNIV
View PDF7 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disc bending method needs to prepare a disc for bending test, which mainly reflects the residual stress of the film as a whole, and is difficult to apply to mechanical structures with complex shapes.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Test method of residual stress of bridge film structure of micro electro mechanical system
  • Test method of residual stress of bridge film structure of micro electro mechanical system
  • Test method of residual stress of bridge film structure of micro electro mechanical system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0027] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary only for explaining the present invention and should not be construed as limiting the present invention.

[0028] In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "upper", "lower", "front", "rear", "left", "right", " The orientations or positional relationships indicated by "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. are based on the orientation or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and simplifying Describes, but does not indicate or imply that the device or element referred...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a test method of residual stress of a bridge film structure of a micro electro mechanical system. The test method comprises step 1, forming a load displacement curve of the bridge film structure of the micro electro mechanical system, obtaining an actual measurement elastic coefficient through the load displacement curve, forming a load displacement curve which is free of the residual stress and obtaining a simulation elastic coefficient which is free of the residual stress through the load displacement curve which is free of the residual stress; step 2, determining a residual stress state of the bridge film structure of the micro electro mechanical system; step 3, obtaining a simulation elastic coefficient with the residual stress through a simulation load displacement curve with the residual stress; and step 4, changing the size of initial residual stress of the bridge film structure of the micro electro mechanical system until that the simulation elastic coefficient with the residual stress is equal to the actual measurement elastic coefficient to enable the size of the initial residual stress at the moment to be the size of the residual stress which is contained in the bridge film structure of the micro electro mechanical system. The test method of the residual stress of the bridge film structure of the micro electro mechanical system has the advantage of being capable of simply testing residual stress of multiple bridge film structures.

Description

technical field [0001] The invention relates to the field of testing, in particular to a method for testing the residual stress of a microelectromechanical system bridge membrane structure. Background technique [0002] MEMS combines microelectronics technology with micromachining technology and other technological means, involving physics, chemistry, biology, microelectronics, mechanical manufacturing and design, materials and other disciplines, and is a cutting-edge technology that intersects multiple disciplines. Micro-electro-mechanical systems are small in size, light in weight, and can be mass-produced. They have irreplaceable advantages in military and civilian fields such as aerospace, aviation, ships, and electronics, and their applications are becoming more and more extensive. [0003] MEMS bridge membrane structures are widely used in MEMS relays, MEMS switches, MEMS variable capacitors and other devices. [0004] Thin films in MEMS bridge membrane structures are...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01L1/00
Inventor 阮勇刘倚瑞马波尤政
Owner TSINGHUA UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products