Integrated plasma generation device
A plasma and generating device technology, applied in the direction of plasma, electrical components, etc., can solve the problems of unstable work, large distance between the matcher and the plasma, etc., and achieve stable impedance matching effect, easy processing situation selection, and interchangeability strong effect
Active Publication Date: 2015-05-06
HARBIN INST OF TECH
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Problems solved by technology
[0006] The purpose of the present invention is to provide an integrated plasma generating device, which is to solve the problem of unstable operation due to the excessive distance between the matching device and the plasma torch during atmospheric plasma processing at normal temperature
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specific Embodiment approach 1
[0016] Specific implementation mode one: combine figure 1 , figure 2 As shown, it consists of a matcher 1, a capacitively coupled plasma jet torch module 2, an inductively coupled plasma torch module 3, and a forming electrode module 4:
[0017]The capacitively coupled plasma jet torch module (2) consists of a capacitively coupled plasma jet torch (2-1), a first connecting bracket (2-2), a first insulating connecting frame (2-3), and a first protective cover (2-4) composition; the bottom end surface of the first insulating connection bracket (2-3) is connected to the middle part of the first connection bracket (2-2), and the capacitively coupled plasma jet torch (2-1 ) is embedded in the hole (2-5) of the first insulating connection frame (2-3), and the first protective cover (2-4) surrounds the capacitively coupled plasma jet torch (2-1) and connected with the first connection bracket (2-2), so that the nozzle of the capacitively coupled plasma jet torch (2-1) is exposed o...
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The invention discloses an integrated plasma generation device, belonging to the technical field of plasma processing equipment, and solving the problem that working instability of the plasma generation device is caused due to the fact that the distance of a matcher and a plasma torch is overlarge in a normal temperature atmosphere plasma machining process. When the matcher and a capacity coupling plasma jet torch module are combined to be connected, the upper end face of a first connecting support of the capacity coupling plasma jet torch module is connected with a lower end face of the matcher; when the matcher and an inductive coupling plasma jet torch module are combined to be connected, the upper end face of a second connecting support is connected with the lower end face of the matcher; and when the matcher and a shaped electrode module are combined to be connected, the upper end face of a third connecting support of the shaped electrode module is connected with the lower end face of the matcher. With the adoption of the integrated plasma generation device, the matcher and the plasma torch are integrated, and need not to be connected by a load line, the distance of the matcher and a load is shortened, the electromagnetic interference on the device from outside can be effectively lowered, and meanwhile, the impedance matching effect is more stable.
Description
technical field [0001] The invention belongs to the technical field of plasma processing equipment. Background technique [0002] Atmospheric plasma processing at room temperature currently uses plasma torches, including capacitively coupled plasma torches (CCP) and inductively coupled plasma torches (ICP). Both of these two plasma torches need to be driven by radio frequency power and tuned by an impedance matcher to work, so radio frequency power and impedance matcher are important components of the atmospheric plasma processing system, they convert alternating current into available plasma The RF current used for excitation. [0003] For radio frequency technology, impedance matching is a common working condition. When the circuit achieves impedance matching, the maximum power transmission will be obtained; when the circuit is mismatched, the energy emitted by the high-frequency power supply will not be transmitted to the load to the maximum extent, and the unloaded ene...
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IPC IPC(8): H05H1/30
Inventor 王波辛强姚英学金会良丁飞李娜金江李铎
Owner HARBIN INST OF TECH