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Large-area atmosphere plasma even discharge electrode

A plasma and discharge electrode technology, applied in the direction of plasma, electrical components, etc., can solve the problems of uneven discharge of large-area electrodes, increase of current density, influence on the accuracy and efficiency of atmospheric plasma processing technology, etc. Uniform phenomenon, the effect of improving machining accuracy and efficiency

Inactive Publication Date: 2013-08-28
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to provide a large-area atmospheric plasma uniform discharge electrode. In order to solve the problem that the alternating current generated by the existing large-area atmospheric plasma discharge has a skin effect that the current density increases at the edge of the electrode, resulting in large The uneven discharge of the area electrode seriously affects the accuracy and efficiency of the atmospheric plasma processing technology

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specific Embodiment approach 1

[0015] Specific implementation mode one: as figure 1 , figure 2 As shown, its shape is flat plate; its discharge surface 1 is provided with a plurality of protruding microelectrodes 2 (arrays), all protruding microelectrodes 2 have the same shape and size, and all protruding microelectrodes 2 and The mutual distances between adjacent protruding microelectrodes 2 are all equal, and the distances between the discharge surfaces of all protruding microelectrodes 2 and their opposite processed surfaces are all equal; on the outer surface of the discharge surface 1, use micro-arc oxidation technology or plasma spraying technology to cover a layer of insulating dielectric layer.

specific Embodiment approach 2

[0016] Specific implementation mode two: as image 3 , Figure 4 , Figure 5 As shown, the difference between this embodiment and the first embodiment is that the protruding microelectrode 2 is a penetrating elongated protuberance. Other compositions and connections are the same as in the first embodiment.

specific Embodiment approach 3

[0017] Specific implementation mode three: as image 3 As shown, the difference between this embodiment and the second embodiment is that the shape of the sectional surface of the protruding microelectrodes 2 is rectangular; the width dimension of the protruding microelectrodes 2 and the distance between them The duty cycle is 0.5-3, and the height of the raised microelectrode 2 is 0.2 mm-3 mm. Other compositions and connections are the same as in the first embodiment.

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Abstract

The invention discloses a large-area atmosphere plasma even discharge electrode and belongs to the field of optical processing. The large-area atmosphere plasma even discharge electrode aims to solve the problems that an alternating current generated by discharging of an existing large-area atmosphere plasma has the skin effect that the current density is increased when the alternating current approaches the edge of the electrode, uneven discharging of the large-area electrode is caused, and precision and efficiency of a processing technology of the atmosphere plasma are seriously influenced. The large-area atmosphere plasma uneven discharge electrode is flat-sheet-shaped. A plurality of protruding microelectrodes are arranged on the discharging surface of the large-area atmosphere plasma even discharge electrode, the shapes and the sizes of all protruding microelectrodes are identical, the distances between each protruding microelectrode and adjacent protruding microelectrode are identical, and the distances between the discharging surfaces of each protruding microelectrode and the processed working surfaces which are opposite to the protruding microelectrodes are equal. The large-area atmosphere plasma even discharge electrode can achieve large-area even discharging of the atmosphere plasma, avoids the phenomenon of uneven discharging caused by the skin effect and the marginal discharge effect when continuous surface electrodes motivate the plasma in an atmospheric environment, and therefore the processing precision and the processing efficiency of the atmosphere plasma can be effectively improved.

Description

technical field [0001] The invention belongs to the field of optical processing. Background technique [0002] Atmospheric plasma chemical processing technology is a chemical processing technology that uses radio frequency power to excite reactive atoms with high density and high reactivity in the atmospheric environment to chemically react with workpiece surface atoms. The excited reactive atoms can be adjusted by the power of the excitation power supply and the flow rate of the reactive gas. Compared with the removal rate of traditional mechanical polishing, the rate of chemical reaction is several times or even ten times higher. It has a wide range of applications in the field of processing large-scale optical components. application value. [0003] At present, the processing form of atmospheric plasma is mainly realized through the motion control of small-diameter plasma jets. Although the efficiency of this processing method has been improved for large-scale precision ...

Claims

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Application Information

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IPC IPC(8): H05H1/24
Inventor 王波金会良姚英学李娜车琳辛强金江李铎
Owner HARBIN INST OF TECH