Multifunctional magnetron sputtering film coating device

Abstract

The invention discloses a multifunctional magnetron sputtering film coating device. The device comprises a vacuum chamber, a top cover, a connecting rod and a substrate frame, wherein the top cover is detachably connected onto the top of the vacuum chamber; the connecting rod is fixedly connected onto the top cover and arranged within the vacuum chamber in a suspension way, the substrate frame is in cup joint with the lower end of the connecting rod in a rotating and lifting way, a plurality of substrate carriers are arranged on the bottom surface of a disc at the bottom of the substrate frame, and heating devices are arranged above the disc and on the positions which correspond to the substrate carriers; a plurality of magnetron sputtering targets arranged on the same periphery are arranged on the position where the bottom of the inner cavity of the vacuum chamber corresponds to the substrate carriers, an inclined angle which is available between the target head arranged at the upper part of each magnetron sputtering target and the main shaft of the vacuum chamber can be adjusted from 0-45 degrees, and a turnover sputtering baffle plate is arranged under the target heads on the magnetron sputtering targets. The device has the characteristics of being compact in structure, high in practicability, and diversified in function, and the requirement for the research of a thin-film technology and a component test by a magnetron sputtering method in the colleges and universities and the scientific research institutions can be met.

Description

Technical field: [0001] The invention relates to a multifunctional magnetron sputtering coating device. Background technique: [0002] Under vacuum conditions, the use of vapor deposition technology to coat thin films on the surface of substrates is an important way to obtain thin film materials with excellent mechanical properties and special physical / chemical properties. It is a research hotspot in the fields of materials science and physical science. The core problem of vapor deposition technology is to use the selected deposition method (such as magnetron sputtering, pulsed laser deposition, etc.) to obtain thin film materials with required properties on the surface of the substrate to be plated. [0003] The magnetron sputtering process needs to be realized by magnetron sputtering equipment. With the continuous development of scientific research and actual film production technology, the requirements for the diversification of the functions of the magnetron sputtering c...

AI Technical Summary

Problems solved by technology

However, the small magnetron sputtering devices currently on the market are difficult to meet the above requirements at the same time

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