Equipment for cleaning reaction chambers

Abstract

Disclosed herein is an apparatus for cleaning a reaction chamber that can effectively remove substances that have adhered to the reaction chamber and that can prevent the reaction chamber from being contaminated during the process of cleaning the reaction chamber. The apparatus includes: a cleaning unit having a brush inserted into the reaction chamber to clean the inside of the reaction chamber; and a shielding unit blocking the substance.

Description

technical field [0001] The present invention generally relates to an apparatus for cleaning a reaction chamber, and more particularly, to an apparatus for cleaning a reaction chamber that can effectively remove foreign substances that have adhered to the reaction chamber, and the apparatus Contamination of the reaction chamber during the process of cleaning the reaction chamber can be prevented. Background technique [0002] Generally, semiconductor manufacturing equipment performs a series of processes including: a deposition process to form a film on a semiconductor substrate; a chemical-mechanical polishing process to planarize a film; a photolithography process to form a photoresist pattern on a film; Resist Pattern Etching process of forming a film into a pattern having electrical characteristics; Ion implantation process of implanting specific ions into predetermined regions of a semiconductor substrate; and Cleaning process of removing impurities from the semiconducto...

AI Technical Summary

Problems solved by technology

Substances that have deposited on the inner surfaces of the reaction chamber fall in the form of particles onto the susceptor or substrate during repeated processes, thereby causing defects

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