Alkali soluble resin and photosensitive resin composition containing the same

A technology of alkali-soluble resins and photosensitive resins, which is applied in the field of alkali-soluble resins and photosensitive resin compositions containing the alkali-soluble resins, and can solve problems such as developing speed, poor sensitivity, poor adhesion, insufficient sensitivity, and slow developing speed , to achieve the effects of excellent sensitivity and adhesion, excellent contrast and light transmittance, and not easy to pattern short circuit

Inactive Publication Date: 2014-01-15
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In Korean Laid-Open Patent No. 10-2010-0060562, a monomer having, as a repeating unit, a monomer containing an unsaturated double bond, a monomer containing an epoxy group, and a monomer having a long side chain and an acid group is disclosed Alkali-soluble resin, but this alkali-soluble resin has the following problems: slow developing speed, low sensitivity, and reduced adhesion, resulting in pattern peeling
[0008] Recently, the size of the display is rapidly developing, and high contrast is constantly required. However, in the existing pigment dispersion, the particle size of the pigment has reached the limit, and there are problems such as color unevenness caused by coarse particles. Therefore, a simultaneous use of Pigments and dyes as colorants
[0009] However, i

Method used

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  • Alkali soluble resin and photosensitive resin composition containing the same
  • Alkali soluble resin and photosensitive resin composition containing the same
  • Alkali soluble resin and photosensitive resin composition containing the same

Examples

Experimental program
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Effect test

manufacture example 1

[0136] Production Example 1: Synthesis of Compound of Chemical Formula 3

[0137] 51.1 g of thioglycolic acid, 39.5 g of triethylamine, and 240 g of tetrahydrofuran were put into a 4-necked round bottom flask equipped with a cooler and a stirrer, and the internal temperature of the reactor was cooled to -10°C while stirring.

[0138] Next, after adding 51.1 g of methacryloyl chloride dropwise for 30 minutes, the reaction temperature was raised to room temperature, and the reaction was continued for 5 hours.

[0139] After completion of the reaction, 90 g of a saturated aqueous sodium bicarbonate solution was added to the reaction liquid, and then 140 g of ethyl acetate was added for extraction. It was washed with 124 g of saturated brine, dried over anhydrous magnesium sulfate, and filtered.

[0140] Thereafter, the organic solvent was removed with a rotary evaporator to obtain 49.5 g of a colorless transparent oily substance, which was subjected to column purification using ...

manufacture example 2

[0144] Production Example 2: Production of Pigment Dispersion Liquid

[0145] 12.0 grams of pigment C.I pigment blue 15:6, 4.0 grams of pigment dispersant DISPERBYK-2001 (manufactured by BYK), 44 grams of solvent propylene glycol methyl ether acetate and 40 grams of propylene glycol methyl ether were mixed for 12 hours by a ball mill, and the It is dispersed to produce a pigment dispersion.

Embodiment 1

[0146] Embodiment 1: the manufacture of alkali-soluble resin

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Abstract

The invention relates to an alkali soluble resin containing a repetitive unit represented by the following chemical formula 1, and a photosensitive resin composition and a colored photosensitive resin composition containing the same, wherein physical properties, such as adhesivity, chemical resistance, developability, sensitivity, strength or elasticity, of the alkali soluble resin are excellent, and the alkali soluble resin is suitable for photoetching material for a panel display, such as a columnar spacer, a color filter, a color resist, a photoresist and so on.

Description

technical field [0001] The present invention relates to an alkali-soluble resin and a photosensitive resin composition containing the alkali-soluble resin. Background technique [0002] Conventionally, in order to maintain a constant distance between upper and lower substrates, a liquid crystal display element has used silica beads or plastic beads having a constant diameter. However, when these beads are randomly distributed on the substrate and located inside the pixel, there is a problem that the aperture ratio decreases and light leakage occurs. [0003] In order to solve this problem, liquid crystal display elements begin to use spacers formed by photolithography inside, and spacers used in most liquid crystal display elements are formed by photolithography at present. [0004] The formation method of the spacer formed by photolithography is to apply a photosensitive resin composition on the substrate, and after irradiating ultraviolet rays through a mask, spacers are ...

Claims

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Application Information

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IPC IPC(8): C08F212/12C08F216/36C08F220/14C08F220/18G03F7/004G02B5/20
Inventor 姜台洙柳在范洪性勋
Owner DONGWOO FINE CHEM CO LTD
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