lpcvd automatic water replenishment system

Abstract

The invention discloses an LPCVD automatic water replenishment system, including wet oxygen SiO 2 process furnace tube, the wet oxygen SiO 2 A water replenishment system is connected to the process furnace tube; the water replenishment system includes a water storage tank, and the water storage tank communicates with the wet oxygen SiO through a water vapor output pipe. 2 The process furnace tubes are connected, and a high-purity nitrogen input pipe is installed on the upper end of the water storage tank. A water inlet is also installed on the water storage tank. A water replenishment device is installed on the water inlet. A heater is installed under the water storage tank. A gravity control device is also arranged on the top, and the gravity control device is connected with the water supply device. The invention provides an LPCVD automatic water replenishment system, which can better control the time and amount of water replenishment, and avoid SiO caused by untimely replenishment. 2 The film formation rate is reduced and the physical properties are deteriorated, which improves the SiO 2 The production efficiency and yield of the film reduce the production cost and promote the healthy development of the enterprise.

Description

technical field [0001] The invention relates to a water supply system, in particular to a wet oxygen SiO 2 The LPCVD automatic water replenishment system used on the process furnace tube. Background technique [0002] Wet Oxygen SiO 2 The process is mainly by using LPCVD to make SiO 2 For thin film, the water replenishment device connected to the process furnace tube is essential. The water replenishment device will continuously provide the moisture required in the processing process. Currently, wet oxygen SiO 2 The water vapor required by the process needs to be regularly added high-purity water into the water supply system by the staff, but sometimes due to various external or human factors, the situation of not adding water in time occurs, and the failure to add water in time will affect SiO 2 The rate of film formation is reduced and the physical properties of the film are deteriorated, which greatly reduces the SiO 2 The production efficiency and yield of the film w...

AI Technical Summary

Problems solved by technology

[0002] Wet Oxygen SiO 2 The process is mainly by using LPCVD to make SiO 2 For thin film, the water replenishment device connected to the process furnace tube is essential. The water replenishment device will continuously provide the moisture required in the processing process. Currently, wet oxygen SiO 2 The water vapor required by the process needs to be regularly added high-purity water into the water supply system by the staff, but sometimes due to various external or human factors, the situation of not adding water in time occurs, and the failure to add water in time will affect SiO 2 The rate of film formation is reduced and the physical properties of the film are deteriorated, which greatly reduces the SiO 2 The production efficiency and yield of the film will increase the production cost and increase the burden on the enterprise, which is not conducive to the development of the enterprise.

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