A method, device and euv light source system for reducing debris using an electric field
A light source system and electrical device technology, applied in nuclear engineering, radiation/particle processing, etc., to achieve the effects of easy implementation, simple structure, and pollution reduction
Active Publication Date: 2016-07-06
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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[0006] The present invention proposes a method, device and EUV light source system for reducing debris by actively charging charged particles plus an electric field composed of a deflection electric field. pollution, especially for debris with a relatively high content of charged particles; second, it does not affect the propagation of light waves such as EUV light, ensuring a high transmittance for light
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[0026] In general, the present invention proposes a method of reducing debris using an electric field and a corresponding device for collecting debris traveling in a specific direction. In the method of the present invention, a charging device capable of actively charging uncharged debris and a deflection electric field are sequentially arranged on the propagation path of the debris, and the deflection electric field can deflect the movement direction of the charged debris before being collected. The device for reducing debris of the present invention includes the power supply device and a device for generating a deflecting electric field and collecting debris. The method and device for reducing debris of the present invention are applicable to charged and non-charged conditions of debris. Moreover, since the electric field does not block the propagation of light, the present invention is applicable to optical systems, and the device can be arranged in the propagation path of ...
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The invention discloses a method, a device and an EUV light source system for reducing debris by using an electric field. In the present invention, a charging device capable of actively charging uncharged debris and a deflection electric field are sequentially arranged on the propagation path of the debris, and the deflection electric field can deflect the moving direction of the charged debris before being collected. In the embodiment of the present invention, the EUV light source system includes an EUV radiation generating device, a light collection system and a debris collection device, the EUV radiation device is used to generate EUV light and generate debris at the same time; the debris generating device is placed in the Between the EUV radiation generation device and the light collection system. The invention can effectively reduce the pollution of debris to vacuum systems and components without affecting the continuous propagation of EUV light.
Description
technical field [0001] The present invention relates to a method and device for reducing debris, in particular to a method, device and EUV light source system for reducing light source debris by using an electric field in an EUV light source system. Background technique [0002] Debris such as charged particles will cause great pollution and harm to vacuum chambers and components. Taking the EUV light source system as an example, whether it is a discharge-generated plasma (DPP) light source or a laser-generated plasma (LPP) light source, when the EUV radiation source radiates extreme ultraviolet light, it will entrain a large number of charged particles and electrically neutral particles. and other debris, most of which are charged particle debris pollutants. For example, the current LPP light source with relatively high energy conversion efficiency uses Sn material as the target material. The 1064nm Nd:YAG laser hits the Sn target. If these debris particles travel to the ...
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IPC IPC(8): G21K1/087
Inventor 谢婉露吴晓斌陈进新王魁波罗艳张罗莎王宇
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI