Method and device for estimating film thickness based on even function seismic response
A technology of seismic response and even function, applied in the field of geophysical exploration, which can solve the problems of difficult application, limited application, and scarcity of seismic attributes.
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[0068] Such as figure 1 As shown, the present invention provides a method for estimating the thickness of a thin layer based on an even function seismic response, comprising the following steps:
[0069] S100. Perform a 90-degree phase conversion on the zero-phase odd-function seismic response to form an even-function seismic response.
[0070] Specifically, step S100 includes the following steps:
[0071] a. Determine the position of the thin layer in the seismic data that conforms to the reflection coefficient ratio of the top-to-bottom reflection interface with -1;
[0072] b. Estimate the wavelet phase of the thin layer position;
[0073] c. Judging the estimated wavelet phase above, if the wavelet phase is zero phase, it indicates that the seismic response corresponding to the zero wavelet phase is an odd function seismic response;
[0074] d. A 90-degree phase conversion is performed on the odd-function seismic response to convert the odd-function seismic response int...
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