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Photosensitive diode

A photosensitive diode, N-type technology, applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of information leakage, unfavorable integration, etc., and achieve the effect of reducing information leakage, improving safety and reducing possibility

Active Publication Date: 2014-02-26
SHANGHAI HUALI MICROELECTRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It can be seen from the figure that this photodiode layout structure is not conducive to large-scale integration due to its asymmetry.
[0005] In addition, since this structure is obviously different from other device structures, it is easy to be identified and used by people with ulterior motives during use, resulting in problems such as information leakage.
[0006] Chinese patent (CN101064351A) and Chinese patent (CN102544139A) both disclose the structure and device of photodiodes, but these two patents do not propose corresponding improvement measures for the above technical problems

Method used

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Embodiment Construction

[0037] The invention provides a photosensitive diode structure, which can be used in processes whose technical nodes are greater than or equal to 130nm, 90nm, 65 / 55nm or 45 / 40nm.

[0038] The main idea of ​​the present invention is to utilize the source terminal, the drain terminal and the substrate of the PMOS to realize the function of the photodiode, that is, form the photodiode structure on the basis of the source terminal, the drain terminal and the substrate of the PMOS.

[0039] The method of the present invention will be described in detail below in combination with specific embodiments and accompanying drawings.

[0040] image 3 It is a schematic diagram of the cross-sectional structure of the photodiode in this embodiment. Such as image 3 As shown, the photodiode structure of the present invention includes a P-type substrate, an N-type well region is formed in the P-type substrate, a silicide layer 1 is arranged at the center of the surface of the N-type well reg...

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Abstract

The invention relates to a photosensitive diode. An N-type well region is formed in a P-type substrate, the surface of the N-type well region is provided with a silicide layer, and the surface of the silicide layer is provided with a polycrystalline silicon layer. A first P-type active region and a second P-type active region are respectively arranged in positions, on the two sides of the silicide layer, of the N-type well region, the surfaces of the first P-type active region and the second P-type active region are respectively provided with a first contact hole and a second contact hole, and a photosensitive area is formed between the inner side of the first contact hole and the inner side of the second contact hole. A first N-type heavily-doped region is arranged in a position, on the left side of the first P-type active region, of the N-type well region, and a second N-type heavily-doped region is arranged in a position, on the right side of the second P-type active region, of the N-type well region. A third P-type heavily-doped region and a fourth P-type heavily-doped region are respectively arranged in positions, on the two sides of the first N-type heavily-doped region, of the P-type substrate. The first N-type heavily-doped region, the second N-type heavily-doped region, the third P-type heavily-doped region and the fourth P-type heavily-doped region are respectively provided with a third contact hole, a fourth contact hole, a fifth contact hole and a sixth contact hole.

Description

technical field [0001] The invention relates to a semiconductor device structure, in particular to a photosensitive diode structure. Background technique [0002] A photosensitive diode (that is, a photosensitive resistor) is a semiconductor device that is very sensitive to light changes. The die of the photosensitive diode is a PN junction with photosensitive characteristics, which has unidirectional conductivity. Therefore, the intensity of light can be used to change the current in the circuit. [0003] A photodiode is also called a photodiode, and its die is a PN junction with photosensitive characteristics. When there is no light, there is a small saturated reverse leakage current, that is, dark current, and the photodiode is cut off at this time. When illuminated, the saturated reverse leakage current increases greatly to form a photocurrent, which changes with the intensity of incident light. When light irradiates the PN junction, electron-hole pairs can be generat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/103H01L31/0352H01L27/144
CPCH01L31/03529H01L31/103
Inventor 张宁王本艳刘小玲
Owner SHANGHAI HUALI MICROELECTRONICS CORP