Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Primary plating-prior-to-etching metal frame subtraction imbedded chip flip plat pin structure and process method

A technology of first plating and then etching, process method, applied in the direction of electrical components, electrical solid devices, circuits, etc.

Active Publication Date: 2014-03-19
JCET GROUP CO LTD
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009]The object of the present invention is to overcome above-mentioned deficiency, provide a kind of metal frame subtractive buried chip flip-chip flat leg structure and its method after plating first, and it can solve the problem of traditional Lack of System Functionality in Metal Leadframes

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Primary plating-prior-to-etching metal frame subtraction imbedded chip flip plat pin structure and process method
  • Primary plating-prior-to-etching metal frame subtraction imbedded chip flip plat pin structure and process method
  • Primary plating-prior-to-etching metal frame subtraction imbedded chip flip plat pin structure and process method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0057] The process method of the present invention is as follows:

[0058] Step 1. Take the metal substrate

[0059] see figure 1 , take a piece of metal substrate with appropriate thickness, the material of this plate is mainly metal material, and the material of metal material can be copper, iron, galvanized, stainless steel, aluminum or metal that can achieve conductive function Material or non-all-metal material, etc., the choice of thickness can be selected according to product characteristics.

[0060] Step 2. Paste photoresist film

[0061] see figure 2 , A photoresist film that can be exposed and developed is pasted on the front and back of the metal substrate to protect the subsequent etching process. The photoresist film can be a dry photoresist film or a wet photoresist film.

[0062] Step 3. Remove part of the photoresist film from the surface of the metal substrate

[0063] see image 3 , use the exposure and developing equipment to expose, develop and rem...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a primary plating-prior-to-etching metal frame subtraction imbedded chip flip plat pin structure and a process method. The primary plating-prior-to-etching metal frame subtraction imbedded chip flip plat pin structure is characterized in that the structure comprises a metal base frame; the metal base frame is internally provided with base islands and pins; the back surface of each base island and the step surface of each pin are invertedly provided with a chip through bottom filling glue; the peripheral areas of the base islands, the areas between the base islands and the pins, the areas between the pins, the areas above the base islands and the pins, the areas under the base islands and the pins and the outer sides of the chips are wrapped with plastic packaging materials; and the front surface of the base island, the front surface and the back surface of each pin as well as the surface of the metal substrate fame are plated with an anti-oxidation layer or a coated antioxidant (OSP), wherein the plastic packaging materials are flush with the anti-oxidation layers or coated antioxidants (OSP) on the upper and lower surfaces of the metal substrate fame. The beneficial effect of the structure and method is that: the problem that the function and the application performance of a conventional metal lead frame are limited since an object cannot be imbedded in the metal lead frame of such plate thickness is solved.

Description

technical field [0001] The invention relates to a metal frame subtractive embedded chip flip-chip flat leg structure and a process method after plating first and then etching. It belongs to the technical field of semiconductor packaging. Background technique [0002] There are two main types of conventional four-sided flat leadless metal leadframe structures: [0003] One is the four-sided flat no-lead package (QFN) lead frame. The lead frame of this structure is composed of a copper metal frame and a high temperature resistant adhesive film (such as Figure 13 shown). [0004] One is the pre-encapsulated quad flat no-leads (pQFN) leadframe, the leadframe structure of this structure includes the lead and the base island, and the etched area between the lead and the base island is filled with plastic encapsulant (such as Figure 14 shown). [0005] The above conventional metal lead frame has the following disadvantages: [0006] 1. The traditional metal lead frame, as the...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L23/495H01L23/31H01L21/56H01L21/60
CPCH01L2224/73204
Inventor 梁新夫梁志忠王孙艳
Owner JCET GROUP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products