Primary plating-prior-to-etching metal frame subtraction imbedded chip flip plat pin structure and process method
A technology of first plating and then etching, process method, applied in the direction of electrical components, electrical solid devices, circuits, etc.
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[0057] The process method of the present invention is as follows:
[0058] Step 1. Take the metal substrate
[0059] see figure 1 , take a piece of metal substrate with appropriate thickness, the material of this plate is mainly metal material, and the material of metal material can be copper, iron, galvanized, stainless steel, aluminum or metal that can achieve conductive function Material or non-all-metal material, etc., the choice of thickness can be selected according to product characteristics.
[0060] Step 2. Paste photoresist film
[0061] see figure 2 , A photoresist film that can be exposed and developed is pasted on the front and back of the metal substrate to protect the subsequent etching process. The photoresist film can be a dry photoresist film or a wet photoresist film.
[0062] Step 3. Remove part of the photoresist film from the surface of the metal substrate
[0063] see image 3 , use the exposure and developing equipment to expose, develop and rem...
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