Metal frame subtractive buried chip flip-chip flat pin structure and process method after etching once
A process method and metal plating technology, applied in the direction of electrical components, electrical solid devices, circuits, etc., can solve the problem of lack of system functions of metal lead frames, and achieve the effects of improving heat dissipation, small size, and cost reduction.
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[0049] The process method of a kind of metal frame subtraction embedded chip flip-chip flat pin structure is as follows in the present invention:
[0050] Step 1. Take the metal substrate
[0051] see figure 1 , take a piece of metal substrate with appropriate thickness, the material of this plate is mainly metal material, and the material of metal material can be copper, iron, galvanized, stainless steel, aluminum or metal that can achieve conductive function Material or non-all-metal material, etc., the choice of thickness can be selected according to product characteristics.
[0052] Step 2. Paste photoresist film
[0053] see figure 2 , A photoresist film that can be exposed and developed is pasted on the front and back of the metal substrate to protect the subsequent etching process. The photoresist film can be a dry photoresist film or a wet photoresist film.
[0054] Step 3. Remove part of the photoresist film from the surface of the metal substrate
[0055] see ...
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