Method for fast forming plasma in liquid cathode glow discharge atomizer
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
- Publication Date
- 2014-04-09
Abstract
Description
technical field
[0001] The invention relates to a method for quickly forming plasma in a liquid cathode glow discharge atomizer, belonging to the technical field of atomic spectrum analysis. Background technique
[0002] In the current research, the main structure of the single liquid electrode discharge system is basically the same, including four parts: light source generation (ie atomizer), spectroscopic system, detection device and data processing system. The atomizer includes a metal anode, a liquid pool, a sampling tube (including a glass capillary) and a drain tube. The liquid sample is introduced into the glass capillary by the peristaltic pump through the sampling tube to overflow, and the overflow part is used as the liquid cathode and the metal anode to generate plasma under the condition of applying high voltage. During the discharge process, the solution in the liquid electrode is continuously vaporized, so that the metal ions dissolved in the solution enter th...