Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A Millimeter-Wave Dual-Reflector Antenna with Near-Field Uniform Beam

A dual-reflector, millimeter-wave technology, used in antennas, waveguide horns, electrical components, etc., can solve problems such as burns, very drastic changes in power density, and inability to reach targets.

Active Publication Date: 2016-03-02
中久安特装备有限公司
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, the high-power millimeter-wave antennas that have been developed abroad all use the focused radiation method, which makes the effective range of the near-field area wider. In locations where the effective power density is twice or even higher, if the target population is located in such a location with too high power density and cannot escape in time, severe burns will likely be caused; greatly reduced, unable to effectively deny the target

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A Millimeter-Wave Dual-Reflector Antenna with Near-Field Uniform Beam
  • A Millimeter-Wave Dual-Reflector Antenna with Near-Field Uniform Beam
  • A Millimeter-Wave Dual-Reflector Antenna with Near-Field Uniform Beam

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0016] All features disclosed in this specification, or steps in all methods or processes disclosed, may be combined in any manner, except for mutually exclusive features and / or steps.

[0017] Such as figure 1 As shown, in the dual-reflector antenna of the present invention, the central area of ​​the main reflector of the main reflector is an approximately focused ellipsoid, and the area near the outer edge of the main reflector is a corrugated surface composed of ring-shaped convex and concave.

[0018] Such as figure 2 As shown, the millimeter-wave beam radiated by the corrugated horn feed 1 is reflected by the secondary reflector 2 to the main reflector 3, and the main reflector 3 reflects the beam again, forming the antenna aperture in front of the main reflector 3 Distribution 4. Finally, a pencil beam with uniform beam power density and beam radius is formed in the near field.

[0019] Such as image 3 As shown, the electric field amplitude distribution of the beam ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a millimeter wave double-reflecting-face antenna with near-field uniform wave beams. The millimeter wave double-reflecting-face antenna comprises a base seat, a main reflecting face, an auxiliary reflecting face and a corrugated horn feed source. The corrugated horn feed source is fixed on the base seat. The auxiliary reflecting face is fixed in front of the corrugated horn feed source. The main reflecting face is fixed on the back of the corrugated horn feed source. The millimeter wave double-reflecting-face antenna is characterized in that the central area of the main reflecting face is in an ellipsoid face shape similar to focus, the area, close to the outer edge, of the main reflecting face is in a corrugated fluctuating face shape composed of annular convex-concaves, the main reflecting face shape of the double-reflecting-face antenna is improved, millimeter wave beams radiated from a feed source horn go through reflection by the auxiliary reflecting face and the main reflecting face, special opening face phase distribution is formed, pen-shaped wave beams even in power density and wave beam radius are generated in the distance ranging from 1.2m to 4.0m in a near field, and shake is less than 10%. The millimeter wave double-reflecting-face antenna can be widely used in the field such as millimeter wave short-range communication, millimeter wave imaging and millimeter wave power wireless transmission.

Description

technical field [0001] The invention relates to the technical field of millimeter-wave antennas, in particular to a millimeter-wave double-reflector antenna with near-field uniform beams. Background technique [0002] The Active Denial System (ADS, Active Denial System) based on high-power millimeter waves is a new type of non-lethal crowd dispersal equipment proposed by the United States in the early 1990s. The beam can cause unbearable scorching pain on the human skin in a few seconds and instinctively escape from the area, so as to stop and disperse the crowd. [0003] At present, the high-power millimeter-wave antennas that have been developed abroad all use the focused radiation method, which makes the effective range of the near-field area wider. In locations where the effective power density is twice or even higher, if the target population is located in such a location with too high power density and cannot escape in time, severe burns will likely be caused; Greatl...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01Q13/02H01Q19/18H01Q15/14
Inventor 徐刚余川屈劲陈世韬薛长江施美友
Owner 中久安特装备有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com