A temperature monitoring method and system for semiconductor heat treatment equipment
A technology of heat treatment equipment and monitoring system, which is applied in the direction of temperature control using electric methods, thermometers using electric/magnetic elements that are directly sensitive to heat, semiconductor/solid-state device testing/measurement, etc., and can solve the problem of control response time lag and other issues to achieve the effect of reducing the impact of fluctuations and eliminating error handling
Active Publication Date: 2015-11-11
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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Problems solved by technology
[0006] ①. Due to the difference in the actual environment of the thermocouple and the time of detection data transmission, the hysteresis of the control response time is caused;
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[0040] Attached below Figure 1-2 , the specific embodiment of the present invention will be further described in detail.
[0041] It should be noted that the present invention aims to realize the monitoring conditions through configuration, and adopts the mode of delay waiting to make the monitoring start at an appropriate time. The effect of reducing the impact of fluctuations.
[0042] In the following embodiments, the temperature control of semiconductor heat treatment equipment can be divided into multiple temperature control areas according to needs, and each temperature control area can include multiple thermocouples and heating units, and each temperature control area can also include a variety of Thermocouples and heating elements.
[0043] see figure 1 , figure 1 It is a structural schematic diagram of a preferred embodiment of the temperature monitoring system for semiconductor heat treatment equipment of the present invention. As shown in the figure, the monit...
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A method used for monitoring temperature of semiconductor heat treatment equipment comprises the steps of setting and obtaining a configuration file; sending a temperature control instruction and starting an asynchronous monitoring thread in a technology process; obtaining an actual value of monitored temperature of a thermoelectric couple, and judging whether a duration beyond a warning generating range value or a stopping generating range value reaches a specified value of abnormal stable time according to the warning generating range value and the stopping generating range; if yes, judging whether the number of exceeding times is greater than the number of times of the abnormal stable time, and if the number of exceeding times is greater than the number of times of the abnormal stable time, giving a fault warning and executing the corresponding fault processing; if not, continuing to executing the normal technology steps. Therefore, the hysteresis quality problem of response time controlling is considered, the scale of abnormal conditions is also defined according to the temperature controlling requirement, error processing caused by normal fluctuation of the temperature or signal interference is eliminated, and the method accords with changing characteristics of the temperature.
Description
technical field [0001] The invention relates to the technical field of integrated circuit manufacturing, and more specifically, to a method and system for monitoring the temperature of semiconductor heat treatment equipment. Background technique [0002] At present, the design of semiconductor devices is developing rapidly in the direction of high density and high integration, which puts forward higher and higher requirements for heat treatment equipment of semiconductor equipment. Due to the complex structure and huge system of semiconductor heat treatment equipment, and the high value of its products (wafers). Therefore, in the semiconductor manufacturing process, users hope that heat treatment equipment can run multiple processes continuously for a long time without failure, which puts forward high requirements on the stability of the equipment. [0003] Semiconductor processing equipment has very strict requirements on temperature conditions, and when these conditions a...
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IPC IPC(8): G05D23/30G01K7/02H01L21/66
Inventor 张立超钟结实刘建涛黄扬君
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD