MEMS microstructure plane displacement measuring method
A technology of displacement measurement and microstructure, which is applied in the direction of measuring devices, special data processing applications, instruments, etc., can solve the problems that the measurement resolution cannot meet the requirements of MEMS microstructure planar motion measurement, and the calculation amount is large, so as to improve the accuracy and high The effect of precision measurements
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[0013] By adopting the method of the present invention, the influence of different lighting on the collected images is avoided; since the rank of the phase correlation matrix of the image is one without noise interference, the singular value decomposition technology is introduced to reduce the amount of calculation in the phase correlation measurement method, and the linearity obtained The phase coefficient uses fractal interpolation to reduce noise and improve the measurement accuracy. The least square method is used to fit the linear phase coefficient of the singular vector to obtain the slope of the fitted line to achieve high-precision MEMS microstructure plane displacement measurement.
[0014] Below in conjunction with accompanying drawing and specific examples the implementation of the present invention will be described as necessary, as figure 1 It is a flow chart of MEMS in-plane displacement measurement in the present invention. Including the following steps:
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