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A lower electrode base platform of dry etching equipment and dry etching equipment

A dry etching and electrode technology, used in circuits, discharge tubes, electrical components, etc., can solve problems such as poor printing, light scattering, and affect the display quality of display panel images, to avoid damage, improve optical properties, and improve display. quality effect

Active Publication Date: 2016-05-25
BEIJING BOE DISPLAY TECH CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] At present, a preferred pedestal 103 above the lower electrode 102 is composed of a substrate and a surface floating point (Embossing Dot) on the surface of the substrate. The surface floating point is made of alumina ceramics. Due to the high hardness of alumina ceramics, generally its The hardness is higher than that of glass. When the glass substrate to be etched is placed on the surface floating point with higher hardness, the surface floating point will inevitably cause a certain degree of damage to the surface and / or internal structure of the glass substrate, resulting in Decreased uniformity of thickness of the glass substrate at the position where the surface floating point contacts and the area near the contact, and / or decreased uniformity of the internal structure
When the dry-etched glass substrate is used as the base substrate of the display panel, when the light from the backlight source or external light source passes through the glass substrate, it is easy to cause light scattering phenomenon, and the light scattering phenomenon occurs when the display panel displays images It will lead to the occurrence of embossing mura, which will seriously affect the optical characteristics of the display panel, thereby affecting the display quality of the display panel image

Method used

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  • A lower electrode base platform of dry etching equipment and dry etching equipment
  • A lower electrode base platform of dry etching equipment and dry etching equipment
  • A lower electrode base platform of dry etching equipment and dry etching equipment

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Embodiment Construction

[0036] The embodiment of the present invention provides a lower electrode base of dry etching equipment and dry etching equipment, to provide a new type of lower electrode base for placing a substrate, placed on the lower electrode base After the base substrate on the substrate is etched by dry etching equipment, the destruction of the uniformity of the internal structure of the base substrate can be avoided, and the undesirable phenomenon of embossing (Embossing Mura) of the display device can be avoided.

[0037] The technical solutions provided by the embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. The contents of the description of the present invention and the accompanying drawings are only used to explain the present invention, and are not intended to limit the present invention.

[0038] The lower electrode base of the dry etching equipment provided by the present invention is a base located on the low...

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Abstract

The invention discloses a lower electrode base platform of a dry etching device and the dry etching device, and provides a novel lower electrode base platform used by a user to place a substrate base plate on. After the substrate base plate placed on the lower electrode base platform is etched through the dry etching device, uniform damage to the inner structure of the substrate base plate can be avoided, and the undesirable phenomenon of Embossing Mura of a display device is avoided. The lower electrode base platform of the dry etching device comprises a first base plate and a plurality of support pieces located on the first base plate, wherein top material of each support piece at least comprises resin.

Description

technical field [0001] The invention relates to the technical field of etching, in particular to a lower electrode base of dry etching equipment and dry etching equipment. Background technique [0002] In the field of display technology, the glass substrate is usually etched through a dry etching process to produce corresponding patterns. Specifically, the glass substrate to be etched is placed in dry etching equipment, and plasma discharge is used to remove the material to be etched on the glass substrate for etching. [0003] The principle of etching will be described below in combination with the structure of dry etching equipment. [0004] see figure 1 , is a schematic structural diagram of dry etching equipment in the prior art, including: a reaction chamber 100, an upper electrode 101 and a lower electrode 102 located in the reaction chamber 100, and a base 103 for placing a glass substrate 104 on the lower electrode 102; During specific implementation, the glass su...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/3065H01J37/32H01J37/04
CPCH01J37/32431H01L21/67069
Inventor 梁魁
Owner BEIJING BOE DISPLAY TECH CO LTD