Transparent conductor for touch screen, preparation method and application thereof
A technology of transparent conductors and touch screens, which is applied in the direction of electrical digital data processing, instruments, and input/output processes of data processing, etc., and can solve problems such as low efficiency, long production time, waste of raw materials, etc.
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[0035] see Figure 4 , a method for preparing a transparent conductor for a touch screen comprising the following steps:
[0036] Step S100 , coating a photoresist on one surface of the transparent substrate.
[0037] see Figure 5 , coating the photoresist 140 on the upper surface of the transparent substrate 110, and prebaking the photoresist 140. The photoresist 140 may specifically be a ma-P1210 type positive photoresist produced by MRT (Micro Resist Technology), with a pre-baking temperature of 100° C. and a pre-baking time of 90 s.
[0038] The material of the transparent substrate 110 is glass or plastic. The glass can be optical quartz glass or ordinary optical glass. The plastic is polymethyl methacrylate or polycarbonate. The thickness of the transparent substrate 110 is 50 μm˜300 μm.
[0039] Step S200, exposing and developing the photoresist to form a pattern area on the surface of the transparent substrate.
[0040] see Figure 6 Firstly, a mask plate is...
Embodiment 1
[0060] A method for preparing a transparent conductor for a touch screen, comprising the following steps:
[0061] 1. Coat one surface of the transparent substrate with photoresist.
[0062] A photoresist is coated on the upper surface of the transparent substrate, and the photoresist is prebaked. The transparent substrate is optical quartz glass with a thickness of 0.3mm and a transmittance of 93%. The photoresist is ma-P1210 type positive photoresist with a thickness of 2 μm. The pre-baking temperature is 100°C, and the pre-baking time is 90s.
[0063] 2. Exposing and developing the photoresist to form a pattern area on the surface of the transparent substrate.
[0064] After utilizing the mask plate to protect the region that the photoresist does not need to be exposed, the ma-P1210 type positive photoresist is exposed and developed to form the upper surface of the optical quartz glass such as figure 2 pattern area as shown, and post-bake the photoresist. Among them, ...
Embodiment 2
[0075] A method for preparing a transparent conductor for a touch screen, comprising the following steps:
[0076] 1. Coat one surface of the transparent substrate with photoresist.
[0077] A photoresist is coated on the upper surface of the transparent substrate, and the photoresist is prebaked. The transparent substrate is soda glass with a thickness of 0.2 mm and a transmittance of 90%. The photoresist is ma-P1210 type positive photoresist with a thickness of 2 μm. The pre-baking temperature is 100°C, and the pre-baking time is 90s.
[0078] 2. Exposing and developing the photoresist to form a pattern area on the surface of the transparent substrate.
[0079] Utilize the mask plate to protect the region that the photoresist does not need to be exposed, expose and develop the ma-P1210 type positive photoresist, to form such as on the upper surface of the soda glass image 3 pattern area as shown, and post-bake the photoresist. Among them, the exposure wavelength of ma-...
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