Locking and unlocking device of mask template box

Abstract

The invention belongs to the field of TFT (thin film transistor) lithography equipment, and in particular relates to a locking and unlocking device of a mask template box. The locking and unlocking device comprises a template fork mechanism, a clamping mechanism and a template box lifting mechanism. The template fork mechanism comprises a left guide rail; a left template fork which is arranged on the left guide rail, and can linearly and reciprocally move; a right guide rail; a right template fork which is arranged on the right guide rail, and can linearly and reciprocally move; a synchronous belt driving adverse movement of the left template fork and the right template fork; and a diver driving the synchronous belt. The clamping mechanism comprises jack catches in one-to-one correspondence with lock fasteners, the template box lifting mechanism supports the template box from the lower part of the template box, and the template box lifts up or down with the template box lifting mechanism. A low-cost micro cylinder and the low-cost synchronous belt are used as transmission parts, protection baffle plates of the template box are increased, locking and unlocking are performed in a stepwise manner to ensure the process is stable and reliable; and in order to ensure the mask work environment, a telescopic seal box is introduced to provide a clean environment.

Description

technical field [0001] The invention belongs to the field of TFT lithography equipment, and in particular relates to a locking and unlocking device for a reticle box. Background technique [0002] The plate box is used as a mask storage device, and its purpose is to protect the mask from the pollution of the external environment. Since the mask is constantly taken and placed during normal work, the plate box needs to be frequently unlocked and locked. At the same time, the mask transmission needs to be carried out in a working environment with a cleanliness of up to CLASS100. This locks and unlocks the plate box. Process safety, stability and cleanliness have high requirements. [0003] The locking and unlocking mechanism of the plate box is an indispensable mechanism for the operation of TFT lithography equipment, and its locking and unlocking methods will directly affect the safety of the mask. [0004] More representative locking and unlocking devices are as follows at ...

AI Technical Summary

Problems solved by technology

[0006] The technical problem to be solved by the present invention is that the locking and unlocking device of the reticle box in the prior art has poor stability and safety, complex structure and high cost, and affects the cleanliness of the mask transmission environment. In order to overcome the above shortcomings, provide A locking and unlocking device for reticle boxes

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