Multi-quantum-well structure for photoelectric device
A multi-quantum well structure and optoelectronic device technology, which is applied in the direction of electrical components, semiconductor devices, circuits, etc., can solve the problems that are rare, the overall effect is not very obvious, and the control of the components of quantum wells stays, and achieve the effect of improving brightness
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[0030] The present invention will be described in further detail below in conjunction with the accompanying drawings.
[0031] The barrier layer structure of the quantum well is generally designed to be thicker at the front and thinner at the back, and the thickness range is 200nm-5nm, which means that the barrier layer of the quantum well structure in the front is thicker than the barrier layer in the back; It is designed to be thin at the front and thick at the back, with a thickness range of 0.1nm-5nm, which means that the well layer of the quantum well structure in the front is thinner than the well layer in the back. E.g:
[0032] For base layers:
[0033] If the total number of quantum wells is M, the thickness of the first N barrier layers can be the same, and the thickness of the M-N barrier layers in the back is the design of thick front and thin back, N
[0034] If the total number of quantum wells is M, the thickness of th...
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