Radio-frequency power measurement system

Abstract

The invention provides a radio-frequency power measurement system. The radio-frequency power measurement system comprises a coaxial power transmission device, a voltage probe, a first current probe, a second current probe and a signal collecting and processing device. The coaxial power transmission device is used for transmitting radio-frequency power signals and comprises an inner conductor stick and an outer conductor ring, wherein the inner conductor stick is arranged in the outer conductor ring in a sleeved mode. The voltage probe is arranged on the outer conductor ring and used for detecting radio-frequency voltage signals of the coaxial power transmission device. The first current probe and the second current probe are arranged on the outer conductor ring and distributed on the two sides of the voltage probe in the axial direction of the inner conductor stick. The signal collecting and processing device is connected with the voltage probe, the first current probe and the second current probe so as to confirm the radio-frequency power of the radio-frequency power signals according to the radio-frequency voltage signals detected by the voltage probe and radio-frequency current signals detected by the first current probe and the second current probe. By means of the radio-frequency power measurement system, phase errors caused by the spatial distance between the voltage probe and the current probes can be eliminated, the radio-frequency power measurement system has high measurement accuracy for the radio-frequency plasma coupling power, and the radio-frequency power measurement system is simple and reliable in structure.

Description

technical field [0001] The invention relates to the field of electrical technology, in particular to a radio frequency power measurement system. Background technique [0002] RF plasma is widely used in plasma material processing processes, such as etching of semiconductor materials and plasma enhanced chemical vapor deposition. During these processes, the RF power coupled from the electrodes to the plasma is a very important control parameter that needs to be accurately measured. Usually, a voltage probe and a current are used to measure the voltage waveform and current waveform at the electrode respectively, and then the RF coupling power P (difference between incident power and reflected power) is calculated by the following formula [0003] P=|V||I|cosθ [0004] Where |V| is the effective value of the voltage, |I| is the effective value of the current, and θ is the phase difference between the voltage waveform and the current waveform. The main error of this method co...

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Problems solved by technology

However, the impedance of the RF plasma equivalent load is usually difficult to determine, which brings a large error to the power measurement

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