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Target adapted to an indirect cooling device

A vapor deposition and backside technology, applied in the field of sputtering and coating sources, can solve the problems of poor thermal conductivity and other issues

Active Publication Date: 2014-12-10
OERLIKON SURFACE SOLUTIONS AG PFAFFIKON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the case of graphite films, although the thermal conductivity in the lateral direction is good, the thermal conductivity in the lateral direction is poor

Method used

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  • Target adapted to an indirect cooling device
  • Target adapted to an indirect cooling device
  • Target adapted to an indirect cooling device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0025] Correspondingly, Figure 4 a shows a target 401 on whose target back side 403 is mounted a carbon film 407 which is self-adhesive on one side with a thickness of between 0.1 mm and less than 0.5 mm. A preferred and in this example chosen thickness of the carbon film is 0.125 mm. In this example, a contact film from the company Kunze is used, part number KU-CB1205-AV.

[0026] exist Figure 4 A more detailed cross-section of the target backside and the boundary surface of the self-adhesive carbon film is also shown in . Here, the carbon film includes an adhesive film 409 (which makes the carbon film a self-adhesive film) and a carbon film 411 .

[0027] according to Figure 4 targets can be well integrated into coating sources with indirect cooling, as in Figure 5 As shown in : a target 501 with a self-adhesive carbon film 507 is fastened to the front side of a source holder 505 with bolts 513, wherein a cooling plate with cooling channels 509 is integrated in the ...

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PUM

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Abstract

The invention relates to a target which is embodied as a material source for a depositing method from the gas phase, comprising a front side and a rear side, characterized in that a self-adhesive carbon film is applied to the rear side. Said target can be embodied as a material source for a sputtering method and / or for an arc evaporation method. A particular advantage is that the target is used in a coating source with indirect cooling, the self-adhesive carbon film being in contact with the surface of the membrane which is part of a cooling channel.

Description

technical field [0001] The invention relates to a target whose surface is used as a material source within the scope of a PVD method, in particular under vacuum conditions. The invention relates in particular to such targets, which are used for sputtering (the term "sputtering" is used synonymously with the PVD method "spraying" below). In use, such a target is mainly held by a source holder, in which means for cooling the target are arranged. The invention relates in particular to a coating source comprising such a target. Background technique [0002] In sputtering, the surface of the target is bombarded with ions under vacuum conditions. The bombardment releases material from the target surface, which can be stored on a substrate provided for this purpose and placed in the field of view of the target surface. The ions required for this are provided by a plasma established above the target surface. The ions are accelerated towards the target by applying a negative volt...

Claims

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Application Information

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IPC IPC(8): C23C14/34
CPCC23C14/3407C09J7/026C09J7/22H01J37/3497H01J37/3435H01J37/3417H01J37/3411H01J37/3426C23C14/34C23C14/54H01J2237/002
Inventor S.克拉斯尼策尔J.哈格曼
Owner OERLIKON SURFACE SOLUTIONS AG PFAFFIKON