Both-way ESD protection device based on transverse PNP structure
A technology of ESD protection and devices, which is applied in the direction of electric solid-state devices, semiconductor devices, electrical components, etc., can solve the problems of large current leakage, high breakdown voltage of ESD protection devices, etc., and achieve the effect of improving flexibility
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0023] The technical solution of the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.
[0024] A bidirectional ESD protection device based on a lateral PNP structure, comprising a P-type substrate 101, a first N-type well 102 is arranged in the P-type substrate, a second N-type well 103 is injected into the first N-type well 101 There is a first P+ implantation region 104, a second P+ implantation region 105, a first N+ implantation region 106, a second N+ implantation region 107, a third P+ implantation region 108, and a fourth P+ implantation region in the second N-type well 103. 109, wherein: the P-type substrate 101, the first N-type well 102 and the second N-type well 103 are all covered with an oxide isolation layer, and from left to right are the first oxide isolation layer 110, the second oxide isolation layer layer 111 , a third oxide isolation layer 112 , a fourth oxide isolation layer...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 