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Glass compound for semiconductor junction protection, manufacturing method of semiconductor device, and semiconductor device

A glass composite, semiconductor technology, applied in the direction of semiconductor/solid-state device manufacturing, semiconductor devices, semiconductor/solid-state device components, etc., to achieve the effect of reducing the firing temperature

Active Publication Date: 2016-07-06
SHINDENGEN ELECTRIC MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0024] However, glass materials mainly composed of lead silicate contain lead, which has a large impact on the environment, so it is considered that the use of glass materials mainly composed of lead silicate will be banned in the near future

Method used

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  • Glass compound for semiconductor junction protection, manufacturing method of semiconductor device, and semiconductor device
  • Glass compound for semiconductor junction protection, manufacturing method of semiconductor device, and semiconductor device
  • Glass compound for semiconductor junction protection, manufacturing method of semiconductor device, and semiconductor device

Examples

Experimental program
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Effect test

Embodiment approach 1

[0094] Embodiment 1 is an embodiment related to the glass compound for semiconductor junction protection. In particular, an embodiment including a glass compound for protecting a semiconductor junction according to Examples 3 to 6 described later.

[0095] The glass compound for protecting a semiconductor junction according to Embodiment 1 is a glass compound for protecting a semiconductor junction used for forming a glass layer for protecting a pn junction in a semiconductor element having a pn junction exposed portion in which a pn junction is exposed, and is composed of a The glass granules are formed without fillers and are produced from a melt obtained by melting a glass raw material. The glass raw material contains at least ZnO, SiO in the following content 2 , B 2 o 3 , Al 2 o 3 , and oxides of at least two alkaline earth metals among BaO, CaO, and MgO, and ZrO 2 and nickel oxide, and substantially free of Pb, As, Sb, Li, Na, K,

[0096] ZnO: 30mol% ~ 60mol%;

...

Embodiment approach 2

[0126] Embodiment 2 is an embodiment related to the glass compound for semiconductor junction protection. In particular, it is an embodiment including the glass compound for protecting a semiconductor junction according to Example 1 described later.

[0127] The glass compound for protecting a semiconductor junction according to the second embodiment basically contains the same components as the glass compound for protecting a semiconductor junction according to the first embodiment, but is different from the semiconductor junction according to the first embodiment in that it does not contain nickel oxide. The protective glass compound is different. That is, the glass compound for protecting a semiconductor junction according to the second embodiment basically contains the same components as the glass compound for protecting a semiconductor junction according to the first embodiment, and is a glass compound for protecting a semiconductor junction made of glass particles. And ...

Embodiment approach 3

[0141] Embodiment 3 is an embodiment related to a glass compound for semiconductor junction protection.

[0142] The glass compound for protecting a semiconductor joint according to the third embodiment basically contains the same components as the glass compound for protecting a semiconductor joint according to the first embodiment, but does not contain ZrO 2 This point is different from the glass compound for semiconductor junction protection concerning Embodiment 1. That is, the glass compound for protecting a semiconductor joint according to Embodiment 2 is a glass compound for protecting a semiconductor joint that is composed of glass particles obtained by melting a glass raw material and does not contain a filler. Liquid production, the glass raw material contains at least ZnO, SiO 2 , B 2 o 3 , Al 2 o 3 , and oxides of at least two alkaline earth metals in BaO, CaO and MgO, nickel oxide, and substantially free of Pb, As, Sb, Li, Na, K.

[0143] In the glass compou...

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Abstract

The glass compound for protecting a semiconductor junction of the present invention is a glass compound for protecting a semiconductor junction for forming a glass layer for protecting a pn junction, and is a glass for protecting a semiconductor junction that is composed of glass particles and does not contain a filler. Composite, the glass particles are produced from a melt obtained by melting a glass raw material containing at least ZnO, SiO2, B2O3, Al2O3, and at least two of BaO, CaO and MgO in a predetermined content. An alkaline earth metal oxide, and substantially free of Pb, As, Sb, Li, Na, K. According to the present invention, a highly reliable semiconductor device can be manufactured even by using a lead-free glass material. Furthermore, compared with conventional glass materials mainly composed of lead silicate, it is possible to reduce the firing temperature when firing a layer composed of a glass compound for semiconductor junction protection, and to manufacture a semiconductor device with excellent switching characteristics.

Description

technical field [0001] The present invention relates to a glass compound for semiconductor junction protection, a method for manufacturing a semiconductor device, and a semiconductor device. Background technique [0002] There is known a semiconductor device manufacturing method in which a glass layer for passivation covering a pn junction exposed portion is formed in the process of manufacturing a mesa type semiconductor device (for example, refer to Patent Document 1). When using this semiconductor device manufacturing method to manufacture a semiconductor device (fast recovery diode (Fast Recovery Diode)) excellent in switching (swiching) characteristics, the following manufacturing method is used. Hereinafter, such a manufacturing method is referred to as a conventional semiconductor device manufacturing method. [0003] Figure 16 and Figure 17 It is an explanatory diagram showing such a conventional method of manufacturing a semiconductor device. Figure 16 (a)~ Fi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/316C03C8/04H01L21/329H01L29/47H01L29/868H01L29/872
CPCH01L21/02142H01L29/08H01L29/0839H01L29/1608H01L29/2003H01L29/6606H01L29/66136H01L29/66363H01L29/66401H01L29/861H01L29/8613H01L21/78C03C8/04C03C3/066C03C8/24H01L23/3178H01L2924/0002H01L21/02161H01L23/291H01L2924/00H01L23/3171
Inventor 小笠原淳伊东浩二六鎗広野
Owner SHINDENGEN ELECTRIC MFG CO LTD