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Optical fingerprint sensor chip grating and manufacturing method thereof

A technology for fingerprint sensors and manufacturing methods, applied in optics, optical elements, diffraction gratings, etc., can solve the problems of low precision and complex structure, and achieve the effect of high precision and simple structure

Active Publication Date: 2016-08-31
BEIJING SUPERPIX MICRO TECHNOLOGY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Complex structure and low precision

Method used

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  • Optical fingerprint sensor chip grating and manufacturing method thereof
  • Optical fingerprint sensor chip grating and manufacturing method thereof
  • Optical fingerprint sensor chip grating and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment approach

[0024] Optical fingerprint sensor chip grating of the present invention, its preferred embodiment is:

[0025] The grating is directly generated on the wafer of the photosensitive unit of the optical fingerprint sensor chip, the photosensitive unit corresponds to the opening, and the circuit part is covered.

[0026] The opaque component of the grating is metal, and all the circuit parts are covered with metal.

[0027] The manufacturing method of above-mentioned optical fingerprint sensor chip grating of the present invention, its preferred embodiment is:

[0028] Include steps:

[0029] A. A transparent silicon dioxide film is generated by CVD (chemical vapor deposition) method on the wafer processed by the photosensitive unit of the optical fingerprint sensor chip;

[0030] B. Generate an opaque metal film by sputtering;

[0031] C. Use photolithography to expose the area that needs light transmission;

[0032] D. After dry etching, the metal in the light-transmitting a...

specific Embodiment

[0039] As shown in Figure 3-1 to Figure 3-5, the production method is as follows:

[0040] 1. SIO 2 - CVD - transparent silicon dioxide film;

[0041] 2. The method of sputtering to make metal;

[0042] 3. Photolithography;

[0043] 4. The method of dry etching etches away the metal corresponding to the photosensitive area;

[0044] 5.1 SOG protective film--transparent silicon dioxide by SPIN ON GLASS method;

[0045] 5.2 The SION produced by PECVD method is transparent silicon oxynitride, the protective film is anti-scratch, and the chip can be used directly.

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Abstract

The invention discloses an optical fingerprint sensor chip grating and a manufacturing method thereof. The grating is directly generated on the wafer of the photosensitive unit of the optical fingerprint sensor chip, and the photosensitive unit corresponds to an opening. Cover with metal. The structure is simple, the precision is high, and the chip can be used directly.

Description

technical field [0001] The invention relates to an optical fingerprint sensor chip, in particular to an optical fingerprint sensor chip grating and a manufacturing method thereof. Background technique [0002] Such as figure 1 , figure 2 As shown, the optical fingerprint sensor adopts the principle of pinhole imaging, and needs to make a grating on each pixel, so as to meet the conditions of pinhole imaging. [0003] In the prior art, it is necessary to make a separate grating. The structure is complex and the precision is low. Contents of the invention [0004] The object of the present invention is to provide a optical fingerprint sensor chip grating with simple structure and high precision and its manufacturing method. [0005] The purpose of the present invention is achieved through the following technical solutions: [0006] In the grating of the optical fingerprint sensor chip of the present invention, the grating is directly formed on the wafer of the photosen...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18G06K9/20
CPCG02B5/1847G06V40/1324
Inventor 冯建中
Owner BEIJING SUPERPIX MICRO TECHNOLOGY CO LTD