Display substrate and preparation method thereof, display device and preparation method thereof
By forming a black matrix on the base substrate of the TFT-LCD display and performing photoresist curing and texturing treatments, diffuse reflection of all visible light is achieved, solving the problem of AR films eliminating reflected light in a narrow range, and improving display effect and product quality while maintaining the thinness of the display.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
preparation example Construction
[0037] An embodiment of the present invention provides a method for preparing a display substrate 11, including forming a black matrix 111 on the first surface A of the base substrate 110 and a method of crossing and defining a plurality of display units 112 by the black matrix 111, such as figure 2 As shown, can also include:
[0038] S101, such as Figure 3a As shown, a photoresist 20 is formed on the second surface B of the base substrate 110 ; wherein, the first surface A and the second surface B are disposed opposite to each other.
[0039] S102, such as Figure 3b As shown, the photoresist 20 at the position corresponding to the display unit 112 is cured, so that the photoresist 20 at the position is cured.
[0040] S103 , removing the photoresist 20 corresponding to the position of the black matrix 111 .
[0041] S104, such as Figure 3c As shown, the second surface B of the base substrate 01 corresponding to the position of the black matrix 111 is roughened, so th...
Embodiment 1
[0058] S201, after the above step S101, if Figure 4 and Figure 5a As shown, a mask plate 21 is provided on the surface of the photoresist 20 . Wherein, the transparent area C of the mask 21 corresponds to the position of the display unit 112 , and the opaque area D of the mask 21 corresponds to the position of the black matrix 111 .
[0059] S202, exposing the photoresist 20, so that the photoresist 20 corresponding to the light-transmitting area A of the mask plate 21 is cured, so that the part of the surface of the base substrate 110 corresponding to the display area can be protected, and the roughening process can be avoided. Surface roughening.
[0060] S203. In the case where the base substrate 110 is a glass substrate, dry air may be filled in the hydrofluoric acid solution to form an etching solution 22 with bubbles, and as Figure 5b As shown, the etching solution 22 is sprayed on the second surface B of the base substrate 110 by high-pressure gas to form a Figu...
Embodiment 2
[0064] After the above step S101, if Figure 6 As shown, using the black matrix 11 as a mask, the photoresist 20 is exposed from the side of the first surface A of the base substrate 110, so that the photoresist 20 corresponding to the position of the display unit 112 is cured, so that the substrate can be The portion of the surface of the substrate 110 corresponding to the display area is protected to avoid roughening of the surface by the texturing process.
[0065] Next, steps S203 and S204 may be adopted, or step S104 may be adopted.
[0066] Embodiment 2 Compared with Embodiment 1, the step of setting the mask plate 21 can be omitted by utilizing the opaque property of the black matrix 111 and adopting different exposure directions.
[0067] An embodiment of the present invention provides a display substrate, such as Figure 3d As shown, it may include a base substrate 110 , a black matrix 111 located on the first surface A of the base substrate 110 , and a plurality of...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More