Six-degree-of-freedom alignment device for mask and base
A technology for aligning device and substrate, which is applied in the field of ultra-precision measurement, can solve the problems of inapplicability of a coater and a lithography machine, a large volume of a mask and a substrate aligning device, and achieves the effect of a simple structure
Inactive Publication Date: 2015-02-04
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology
[0003] In view of this, the purpose of the present invention is to solve the problem that the mask and substrate alignment device are not suitable for coating instruments and photolithography machines due to their bulky volume. For this reason, the present invention provides a six-degree-of-freedom, compact mask and Substrate Alignment Device
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[0027] In order to make the purpose, technical solution and advantages of the present invention more clear, the working principle, structure and specific implementation of the present invention will be further introduced below in conjunction with the accompanying drawings.
[0028] Such as Figure 1a , Figure 1b and Figure 1c A schematic diagram showing the structure of the mask and substrate six-degree-of-freedom alignment device provided by the present invention, the alignment device includes a mask 1, a mask holder 2, an elastic reed 3, a compression reed 4, a compression spring preload 5, Y1 Handwheel 6a, Y2 handwheel 6b, extension spring preload 7, base 8, base bracket 9, X handwheel 10, base 11, compression screw 12, of which:
[0029] The mask support 2 is in the shape of a disc for carrying the mask; the elastic reed 3 has an inner ring 3b and three protrusions 3a, the inner ring 3b is connected to the mask support 2 through screws, and the three protrusions 3a are ...
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The invention provides a six-degree-of-freedom alignment device for a mask and a base. The device comprises the mask, a mask bracket, an elastic reed, a press reed, a pressure spring pre-tensioner, a Y hand wheel, a tension spring pre-tensioner, the base, a base bracket, an X hand wheel, a substrate and pressing screws, wherein the mask bracket is disc-shaped and is used for bearing the mask; the elastic reed is provided with an inner ring and three bumps; the inner ring is connected with the mask bracket through screws; the three bumps are connected with a convex surface of the substrate through screws; one end of the press reed is connected with a supporting surface of the substrate through screws, and the other end of the press reed is pressed on a shoulder surface of the base bracket; the pressure spring pre-tensioner is connected with the supporting surface of the substrate through screws and is tangent with the substrate bracket; the Y hand wheel comprises a Y1 hand wheel and a Y2 hand wheel, is connected with the supporting surface of the substrate through screws and is tangent with the base bracket; one end of the tension spring pre-tensioner is connected with the supporting surface of the substrate through screws, and the other end of the tension spring pre-tensioner is connected with the base bracket through screws. The device has a compact structure, is suitable for environments of narrow spaces and can perform six-degree-of-freedom precision alignment of the mask and the base.
Description
technical field [0001] The invention belongs to the technical field of ultra-precision measurement, and relates to a device for aligning a mask and a substrate with six degrees of freedom. Background technique [0002] In the process of coating and photolithography, it often involves the overlay alignment of existing patterns on the substrate and mask patterns, which requires high-precision alignment of the mask and the substrate. The alignment of the mask and the substrate requires not only the alignment of the mask and the substrate in the horizontal plane, but also the adjustment of the vertical gap and parallelism between the two. At present, the commonly used mask-substrate alignment devices are mostly a combination of multiple devices such as two-dimensional translation tables, turntables, and tilt adjustment tables, which are not only costly but also too bulky, so the existing mask and substrate alignment devices cannot It can be used in equipment such as coating ins...
Claims
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IPC IPC(8): G05G13/00
Inventor 李金龙胡松赵立新
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI