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A mask pre-alignment system for lithography machine based on position sensor

A pre-alignment and sensor technology, applied in the field of lithography, can solve the problems of decreased alignment accuracy and replacement of light sources

Active Publication Date: 2018-01-26
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The pre-alignment accuracy is mainly affected by factors such as the stability of the illumination, the size of the energy, etc., especially after long-term use, the light source is aging, and the pre-alignment mechanical constant needs to be re-calibrated, and the alignment accuracy will also decrease, or the light source needs to be replaced

Method used

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  • A mask pre-alignment system for lithography machine based on position sensor
  • A mask pre-alignment system for lithography machine based on position sensor
  • A mask pre-alignment system for lithography machine based on position sensor

Examples

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Effect test

no. 1 approach

[0033] Such as figure 1 As shown, the pre-alignment device of the present invention includes a lighting power supply 1 , a left lighting component 2 , a right lighting component 3 , a mask plate 4 , a left PSD position sensor 7 , a right PSD position sensor 8 and a signal amplification and processing system 9 .

[0034] The lighting power supply 1 is used to supply power to the left lighting component 2 and the right lighting component 3 .

[0035] The left lighting part 2 has the same structure as the right lighting part 3, such as figure 2 As shown, both are composed of a light source 10 and a collimating lens 11 .

[0036] The mask plate 4 has a left pre-alignment mark 5 and a right pre-alignment mark 6 , and the collimated and uniform illumination spots generated by the left and right lighting components respectively illuminate the left pre-alignment mark 5 and the right pre-alignment mark 6 . The left pre-alignment mark 5 and the right pre-alignment mark 6 have the sam...

no. 2 approach

[0050] Such as image 3 As shown, on the basis of the first embodiment according to the second embodiment of the present invention, two double telecentric optical imaging lenses 12 with magnification are placed above the left PSD position sensor 7 and the right PSD position sensor 8 respectively. 13. To amplify and image the position information of the left marker spot and the right marker spot on the left PSD and right PSD respectively, so that the pre-alignment accuracy can be improved on the basis of the resolution of the PSD position sensor, and the illumination uniformity no longer affects the pre-alignment. Measured linearity of alignment.

[0051] Such as Figure 4 As shown, taking a PSD position sensor with a resolution of 50nm as an example, when the pre-alignment mark moves 25nm and is enlarged by a bi-telecentric imaging lens with a magnification of 2 times, the light spot moves 50nm on the PSD position sensor, which can Recognized by the PSD position sensor, ther...

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Abstract

The invention discloses a mask pre-alignment system for a lithography machine, comprising: an illumination component, a mask plate with a pre-alignment mark, characterized in that: a position sensing device corresponding to the pre-alignment mark, the illumination The component illuminates the pre-alignment mark, and the position sensing device collects the light spot generated after the pre-alignment mark is illuminated by the lighting component, and outputs a current value representing the position information of the pre-alignment mark, according to the current value to calculate the horizontal position and rotation angle information of the mask.

Description

technical field [0001] The invention relates to the field of lithography, in particular to a position sensor-based mask pre-alignment system for a lithography machine. Background technique [0002] Mask pre-alignment technology has undergone mechanical pre-alignment, camera pre-alignment, and four-quadrant detector pre-alignment. The alignment accuracy has been improved from a few microns to hundreds of nanometers, and it is suitable for lithography in front-end chip manufacturing. In order to adapt to the improvement of line width and overlay accuracy of lithography machines in the future, the mask pre-alignment accuracy needs to be increased to tens of nanometers. [0003] Patent CN200810202699 provides a mask pre-alignment device, which is characterized by using a pair of telecentric imaging systems to image the Pozi mark on the mask plate to the four-quadrant sensor detection, and obtain the current value of each quadrant of the four-quadrant detector The horizontal pos...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G03F9/00
Inventor 张品祥储兆祥
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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