Silicon-based microring polarization demultiplexer

A demultiplexer and micro-ring technology, applied in the field of integrated optics, to achieve the effects of reliability assurance, high reliability, and increased capacity
CN104459879AActive Publication Date: 2015-03-25SOUTHEAST UNIV

Patent Information

Authority / Receiving Office
CN Β· China
Current Assignee / Owner
SOUTHEAST UNIV
Publication Date
2015-03-25

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Abstract

The invention discloses a silicon-based microring polarization demultiplexer which comprises a silicon substrate and a wrapping layer. The silicon-based microring polarization demultiplexer is characterized by comprising an input waveguide, a transverse electric mode output waveguide, a transverse magnetic mode output waveguide, hybrid plasma waveguides and a microring; the substrate is located at the inner bottom of the wrapping layer, and the hybrid plasma waveguides and the microring are located on the surface of the substrate; each hybrid plasma waveguide comprises a dielectric waveguide, a filling layer and a metal covering layer in sequence from bottom to top; the dielectric waveguides are closely attached to the substrate; the input waveguide is connected with the transverse magnetic mode output waveguide through one hybrid plasma waveguide; the transverse electric mode output waveguide is connected with the other hybrid plasma waveguide, and the microring is located between the two hybrid plasma waveguides. The silicon-based microring polarization demultiplexer has the advantages of being high in polarization demultiplexing efficiency, compact in structure, low in manufacturing difficulty, relatively low in price, capable of being compatible with a wavelength division multiplexing system based on a microring resonator and the like.
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Description

technical field

[0001] The invention relates to the technical field of integrated optics, in particular to a silicon-based microring polarization demultiplexer. Background technique

[0002] Since the hybrid plasmonic waveguide was first proposed by Professor Zhang Xiang's team at the University of California, Berkeley in 2008, it has quickly attracted the attention of many researchers. This kind of waveguide is to deposit a thin layer of low-refractive index material and a layer of metal sequentially outside the ordinary dielectric waveguide, which makes the optical signal mode it can carry between the dielectric waveguide and the plasma waveguide, and has a dielectric waveguide The low loss characteristics and the strong mode field confinement capability and polarization dependence of the plasmonic waveguide. At present, many photonic devices designed and fabricated using this waveguide have been reported, such as couplers, modulators, polarization controllers, optical lo...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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