Manufacturing method of semiconductor device
A manufacturing method and semiconductor technology, applied in semiconductor devices, semiconductor/solid-state device manufacturing, electric solid-state devices, etc., to achieve the effects of improving electrical properties, increasing driving current, and increasing carrier mobility
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[0030] It can be seen from the background art that there are still problems to be solved in the formation process of semiconductor devices in the prior art.
[0031] According to the research on the formation process of semiconductor devices, it is found that the formation process of semiconductor devices includes the following steps, please refer to figure 1 : Step S1, providing a semiconductor substrate, the semiconductor substrate includes a first region and a second region; Step S2, forming a first gate structure on the surface of the semiconductor substrate in the first region, and forming a semiconductor substrate in the second region A second gate structure is formed on the surface of the substrate, and there are offset spacers on both sides of the first gate structure and the second gate structure; step S3, forming a covering semiconductor substrate, the first gate structure and the second gate structure The first mask layer of the pole structure; step S4, patterning t...
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