In-situ testing platform for thermal chemical vapor deposition

Abstract

The invention provides an in-situ testing platform for thermal chemical vapor deposition. The in-situ testing platform comprises a high-temperature hot platform reaction cavity, a ceramic heating platform, a temperature controlling system, a vacuum system, a reaction gas mixing system and a vacuum measuring system, wherein the high-temperature hot platform reaction cavity consists of a hot platform base and a vacuum outer cover, the vacuum outer cover consists of a frame main body, an incident window plate and an exit window plate, the incident window plate and the exit window plate are tightly installed on the frame main body; the ceramic heating platform is installed on the hot platform base to be used for bearing a sample; the temperature controlling system is used for regulating the temperature of the ceramic heating platform in real time; the vacuum system is used for vacuumizing the interior of the high-temperature hot platform reaction cavity; the reaction gas mixing system is used for providing a gas source needed by the thermal chemical vapor deposition for the interior of the high-temperature hot platform reaction cavity; the vacuum measuring system is used for monitoring the gas pressure intensity in the high-temperature hot platform reaction cavity in real time. The in-situ testing platform is capable of penetrating through x ray and also capable of online regulating the reaction conditions including the temperature, the pressure and an air flow, so that real-time in-situ characterization and study of the processes including growth and phase variation of a material in the thermal chemical vapor deposition process can be realized online.

Description

technical field [0001] The invention relates to the field of in-situ testing, in particular to an in-situ testing platform capable of thermal chemical vapor deposition. Background technique [0002] Thermal chemical vapor deposition refers to the chemical reaction of gaseous substances in the gas phase or gas-solid interface under the activation and drive of heat, so as to produce stable solid deposits (or give certain characteristics to the surface of solid materials) A material preparation technology. Thermochemical vapor deposition technology is a very important technical means in the field of modern material synthesis chemistry. It has been extensively studied in the fields of material purification, development of new crystals, preparation of oxidation-resistant, corrosion-resistant and thermal shock-resistant coatings, and preparation of semiconductor thin films. with application. [0003] In the process of thermal chemical vapor deposition, the change of the microstr...

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Problems solved by technology

[0004] Unfortunately, because the thermal chemical vapor deposition process usually requires high temperature and tightness, the reaction chamber is almost completely impenetrable to x-rays, and ordinary thermal chemical vapor deposition equipment is bulky and complicated to operate, making it difficult to achieve x-ray detection. in situ real-time characterization

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