Reaction chamber and plasma processing equipment

Abstract

A reaction chamber and plasma processing equipment provided by the present invention are provided with multi-layer trays made of magnetically permeable materials to carry workpieces to be processed in the reaction chamber, and are arranged at intervals along the vertical direction, which includes heating the trays The heating unit includes an AC power supply, a heating coil and an auxiliary coil arranged around the side wall of the reaction chamber, the heating coil is located at a position corresponding to the area where the multi-layer tray is located, and is connected to the AC power supply, and adopts induction heating The tray is heated by means of a closed loop structure; the auxiliary coil itself is a closed loop structure located above the top and / or below the bottom of the heating coil to form an induced magnetic field when the heating coil is supplied with alternating current and to adjust the magnetic field formed by the heating coil. The distribution of the alternating magnetic field makes the radial temperature of each tray tend to be uniform. The reaction chamber provided by the invention can improve the uniformity of the temperature of the workpiece to be processed, thereby improving the process quality and yield rate.

Description

technical field [0001] The invention belongs to the field of semiconductor equipment manufacturing, in particular to a reaction chamber and a plasma [0002] Daughter processing equipment. Background technique [0003] Metal-organic Chemical Vapor Deposition (MOCVD) is a new type of vapor growth technology developed on the basis of vapor phase epitaxial growth, which can precisely control the thickness and composition of the epitaxial layer. Key technology of optoelectronic devices. The process quality of MOCVD equipment is related to the uniformity of gas flow and temperature in the reaction chamber, and the uniformity of temperature especially refers to the temperature uniformity of the area on the tray carrying the workpiece to be processed. [0004] At present, MOCVD equipment with a vertical structure is usually used, and the production capacity of the MOCVD equipment can be greatly increased by setting multi-layer carrier trays. figure 1 It is a simplified structura...

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Problems solved by technology

[0005] However, the above-mentioned MOCVD equipment inevitably has the following problems in practical applications, namely: figure 2 As shown, since the magnetic field lines of the alternating magnetic field are densely distributed in the area close to the heating coil 4 than in the area far away from the heating coil 4, the magnetic field strength in the edge area of ​​the tray 2 is greater than that in the central area, thus causing the tray 2 The eddy current induced in the edge area of ​​the tray 2 is more than that in the center area, which causes the temperature of the edge area of ​​the tray 2 to be higher than the temperature of the center area, resulting in uneven temperature of the tray 2 along the radial direction, thus causing the load on the upper surface of the tray 2 The temperature of the processed workpiece is uneven, which leads to poor process quality and low yield

Moreover, in order to improve the uniformity of the temperature of the processed workpiece, the temperature of the central area and the edge area can be as close as possible by means of the heat conduction of the tray 2 itself and the heat radiation between adjacent trays 2, which requires a long time for uniform temperature. Time and additional insulation facilities, resulting in long process time and high production costs

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