Monolithic usable solar control coated glass and method of making the same
A technology for sunlight control and coated glass, applied in the field of coated glass, can solve the problems of poor acid and alkali resistance and salt spray corrosion resistance, inability to provide mechanical protection for functional layers, and poor scratch resistance of surface protective layers. Salt spray corrosion resistance to high temperature oxidation, excellent scratch resistance, excellent decorative effect
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Embodiment 1
[0028] figure 1 It is a schematic diagram of the layer structure of the coated glass according to the embodiment of the present invention. refer to figure 1 The solar control coated glass that can be used in a single piece in this embodiment includes a solar control film layer that is sequentially plated from the glass substrate 1 and on one side of the glass substrate 1. There are 6 layers of film layers in this embodiment. From the glass substrate 1 Outward in sequence are the dielectric barrier layer 2 , the first sacrificial layer 3 , the functional layer 4 , the second sacrificial layer 5 , the dielectric support layer 6 and the top protection layer 7 . In the present embodiment, the glass substrate 1 is common float glass with a thickness of 6mm; the dielectric barrier layer 2 is Si 3 N 4The film layer has a thickness of 42nm; the first sacrificial layer 3 is a NbZr film layer with a thickness of 2nm; the functional layer 4 is a NiCr film layer with a thickness of 6nm...
Embodiment 2
[0041] According to the optical constant of the single-layer film and the principle of thin-film interference, the coated glass with a different reflection color from the glass surface in Example 1 was prepared in this example. The only difference between this embodiment and embodiment 1 is that the dielectric barrier layer 2 is made of Si 3 N 4 film layer with a thickness of 30nm; the first sacrificial layer 3 is a NbZr film layer with a thickness of 2nm; the functional layer 4 is a NiCr film layer with a thickness of 4nm; the second sacrificial layer 5 is a NbZr film layer with a thickness of 2nm; the dielectric support layer 6 is Si 3 N 4 Film layer with a thickness of 28nm; the top protective layer 7 is ZrYO X The film layer has a thickness of 13nm.
[0042] In the embodiment of the present invention, the thickness of the glass substrate 1 can be any thickness, such as the common specifications of existing glass 3mm, 5mm, 6mm, 8mm, 12mm, etc.; the function of the diele...
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