Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Base plate supporting device and method and vacuum drying device

A technology of vacuum drying equipment and supporting devices, which is applied in the direction of drying solid materials, dry cargo handling, drying chambers/containers, etc., which can solve problems such as high risk of failure, complicated design and operation of supporting devices, and reduce display defects and design Difficulty, quality improvement effects

Inactive Publication Date: 2015-05-13
HEFEI BOE OPTOELECTRONICS TECH +1
View PDF7 Cites 21 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The purpose of the present invention is to provide a substrate supporting device, a supporting method, and vacuum drying equipment to solve the problems of complicated design and operation and high risk of failure of existing supporting devices

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Base plate supporting device and method and vacuum drying device
  • Base plate supporting device and method and vacuum drying device
  • Base plate supporting device and method and vacuum drying device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach

[0054] As a first embodiment of the present invention, the schematic diagram of the fixing mechanism 6 is as follows Figure 7a-Figure 7c Shown, the schematic diagram of lifting mechanism 7 is as Figure 8a-Figure 8c as shown, Figure 9a-9c It is a schematic diagram of the combination of the fixing mechanism 6 and the lifting mechanism 7 in this embodiment.

[0055] In the first embodiment, the end surface of the through hole 62 is a closed figure, a plurality of through holes 62 are evenly arranged in the table 61 , and the shape of the flat portion 71 matches the shape of the through hole 62 at the corresponding position. Preferably, the closed figure includes a rectangle or a circle. Correspondingly, the shape of the flat part includes rectangle or circle. The table top 61 is supported by a plurality of pillars 63, and the bottom of the pillars 63 is fixed on the bottom of the chamber 1 of the vacuum drying equipment (refer to Image 6 ).

[0056] The lifting mechanism...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides base plate supporting device and method and a vacuum drying device. The base plate supporting device comprises a fixed mechanism and a lifting mechanism; the fixed mechanism comprises a table top; a plurality of through holes are formed in the table top; the lifting mechanism comprises a plurality of flat plate parts corresponding to the through holes; the plurality of flat plates can be respectively positioned into the corresponding through holes and form a supporting surface tighter with the table top to support a base plate; the flat plate part can movably pass through the corresponding through hole. According to the base plate supporting device, the mode that the fixed mechanism and the fixing mechanism are matched is adopted, thus the base is kept on the flat table top in the whole drying process, the contact mode is changed from the point contact into the surface contact, and therefore, a product can be avoided adverse risk; in addition, the products of different models can be switched without moving the supporting device, so that the workload of people can be reduced, and the design difficulty of the device can be reduced.

Description

technical field [0001] The present invention relates to the technical field of display panel manufacturing, in particular to a substrate supporting device and a supporting method, and vacuum drying equipment including the substrate supporting device. Background technique [0002] In the manufacturing process of array substrates and color filter substrates, most of the film layers involve the coating, exposure and development processes of photoresist. After the photoresist coating is completed, vacuum drying treatment is required, that is, at room temperature and the atmospheric pressure is close to 0Pa, the solvent is volatilized, so that the uniformity and hardness of the film layer can be maintained at a certain level, which is suitable for subsequent exposure and development. craft ready. [0003] The internal structure of the chamber of the existing vacuum drying equipment is as follows: figure 1 As shown, a certain number of movable support Pins 2 are arranged on the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67H01L21/687
CPCH01L21/67034H01L21/68742F26B5/042F26B25/003F26B25/10H01L21/6875F26B5/04H01L21/68735
Inventor 王曼翟玉漫
Owner HEFEI BOE OPTOELECTRONICS TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com