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Five-cavity full-automatic electron beam deposition system

An electron beam deposition, fully automatic technology, applied in ion implantation plating, metal material coating process, coating, etc., can solve the problems of long production time and high cost, so as to increase production, save pumping time and reduce cost Effect

Inactive Publication Date: 2015-05-20
SHENYANG SCI INSTR RES CENT CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The system solves the problems of long production time and high cost in the prior art

Method used

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  • Five-cavity full-automatic electron beam deposition system

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Embodiment Construction

[0018] The present invention will be further described in detail below in conjunction with the drawings.

[0019] Such as figure 1 As shown, the present invention includes an air extraction system and five cavities. The five cavities include a transfer chamber I1, a loading chamber I3, a process chamber 5, a loading chamber II8, and a transfer chamber which are arranged sequentially from top to bottom and communicate with each other. Cavity II10, each cavity is connected with the air extraction system.

[0020] The pumping system includes a vacuum pumping system I2, a vacuum pumping system II4, a vacuum pumping system III6, a vacuum pumping system IV7, and a vacuum pumping system V9, wherein the vacuum pumping system I2 is arranged on the top of the loading chamber I3, And respectively communicate with the transfer cavity I1 and the loading cavity I3. A vacuum exhaust system II4 is placed on the top of the process chamber 5, and a vacuum exhaust system III6 is placed on the sidew...

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Abstract

The invention relates to the technical field of preparing various thin films on glass, plastic and ceramic matrixes and particularly relates to a five-cavity full-automatic electron beam deposition system. The system comprises a suction system and five cavities which comprise a transmission cavity I, a loading cavity I, a process cavity, a loading cavity II and a transmission cavity II sequentially communicated, wherein the cavities are connected with the suction system; vacuum locking systems are arranged between the loading cavity I and the process cavity and between the loading cavity II and the process cavity; sample carrying plates are arranged in the loading cavity I, the process cavity and the loading cavity II. According to the system provided by the invention, the suction time after exchanging the sample carrying plate every time in the process cavity is shortened while the output is high, so that the process flow of the process cavity and pick-and-place of the sample carrying plate in the loading cavities I and II are carried out at the same time. Moreover, other parts except a process cavity door and doors of the loading cavities I and II in the clean room can be placed in a common environment, so that the cost is relatively low.

Description

Technical field [0001] The invention relates to the technical field of preparing various thin films on glass, plastic and ceramic substrates, in particular to a five-cavity fully automatic electron beam deposition system. Background technique [0002] The application of electron beam deposition metallizes the plastic surface, combines organic and inorganic materials, greatly improves its physical and chemical properties, makes its surface smooth, and improves surface hardness. The surface of the original plastic is soft and easily damaged. Through vacuum coating, the hardness and abrasion resistance are effectively increased, and the water absorption is reduced. The more coating times, the fewer pinholes and the lower the water absorption. The product is not easy to deform, easy to clean, and does not absorb dust. The electron beam deposition method is a continuous automated production method with the most mature technology and simpler operation among several methods for prepari...

Claims

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Application Information

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IPC IPC(8): C23C14/30C23C14/56
CPCC23C14/30C23C14/56
Inventor 赵崇凌赵科新李士军洪克超徐宝利张健张冬王磊李松林峰雪
Owner SHENYANG SCI INSTR RES CENT CHINESE ACAD OF SCI
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