Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Vacuum system for efficiently pumping gases with small molecular weights

A small molecular weight, vacuum system technology, applied in the field of vacuum system, can solve the problems of large volume and low effective pumping speed, and achieve the effect of improving effective pumping speed and reliability

Inactive Publication Date: 2015-05-20
SHENYANG SCI INSTR RES CENT CHINESE ACAD OF SCI
View PDF4 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The above situation makes the vacuum system corresponding to MOCVD and PECVD process have the problems of large volume and low effective pumping speed

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Vacuum system for efficiently pumping gases with small molecular weights
  • Vacuum system for efficiently pumping gases with small molecular weights

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0015] The present invention will be further described below in conjunction with the drawings.

[0016] Such as figure 1 As shown, the present invention includes a controller, a primary vacuum pump 2 and a secondary vacuum pump 3, wherein there are multiple secondary vacuum pumps 3, and multiple secondary vacuum pumps 3 are connected in parallel to the primary vacuum pump 2. The primary vacuum pump 2 and each secondary vacuum pump 3 are both connected to the controller, and the primary vacuum pump 2 is connected to the process vacuum chamber.

[0017] The first-stage vacuum pump 2 is a Roots vacuum pump, the second-stage vacuum pump 3 is a multi-stage dry vacuum pump, and the multi-stage dry vacuum pump is a multi-stage pump with a combination of Roots and claw rotors, which can directly discharge gas to Outside of the pump, its special structure design can make it work stably at a speed above 3000 rpm (revolutions per minute). The high speed can improve the carrying capacity of sm...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a vacuum system used in semiconductor and LED preparation processes and particularly relates to a vacuum system for efficiently pumping gases with small molecular weights. The vacuum system comprises a controller, a first-grade vacuum pump and a plurality of second-grade vacuum pumps, wherein the first-stage vacuum pump is connected with the second-stage vacuum pumps; both the first-stage vacuum pump and the second-stage vacuum pumps are connected with the controller; and the first-stage vacuum pump is connected with a process vacuum chamber. The plurality of second-stage vacuum pumps are connected with the first-stage vacuum pump after being connected in parallel. By using the vacuum system, more gases with low molecular weights can be carried within unit time, and the backflow of the gases with low molecular weights can be reduced, so that the gases with low molecular weights are efficiently pumped.

Description

Technical field [0001] The invention relates to a vacuum system in a semiconductor preparation process and an LED preparation process, in particular to a vacuum system for efficiently pumping small molecular weight gases. Background technique [0002] In the semiconductor manufacturing process and LED manufacturing process, individual processes (such as MOCVD, PECVD) require a large amount of hydrogen (hydrogen is a small molecular weight gas) as the accompanying gas. As the main equipment of the process becomes larger, the amount of hydrogen used gradually increases Taking the main equipment of the 100L process as an example, the consumption of the accompanying gas hydrogen is 100 slm. If it is expanded to the main production process equipment of the mainstream production, the consumption of the accompanying gas hydrogen is required to be above 200 slm, and the vacuum pressure is required to be maintained below 100 torr. The molecular weight of hydrogen is small and the gas is e...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): F04C25/02F04C23/00
Inventor 孔祥玲王光玉雷震霖张振厚
Owner SHENYANG SCI INSTR RES CENT CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products