Acidic precision polishing solution preparing formula

A precision polishing, acid technology, applied in polishing compositions containing abrasives, etc., can solve the problems of left scratches, rough production, scratches, etc., to achieve large friction ion particles, difficult to leave scratches, hard texture. Effect

Inactive Publication Date: 2015-05-27
QINGDAO GUYU GRAPHITE
View PDF0 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] With the rapid development of the jewelry industry, the demand for polishing agents for gemstones is also increasing day by day. During the processing of gemstones, they need to be polished and polished and their thickness increased or decreased. Therefore, there are strict requirements on polishing agents. The current polishing agents are due to Its production is rough, and it is easy to leave scratches on the smooth gem surface, which is difficult to make up, causing serious economic losses to the merchants
[0003] In order to overcome the above problems, the present invention provides a formula for making an acidic precision polishing liquid, which greatly solves the danger of uneven gemstone polishing surface and easy scratches, and strives for excellence in the manufacturing process to achieve an effective polishing effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0007] Example 1: Main components: 75% of diamond powder, 3% of abrasive, 16% of reset calcium carbonate, 6% of silicon dioxide, and appropriate amount of water.

[0008] The preparation formula of the acid precision polishing liquid is characterized in that: the ingredients are evenly proportioned and stirred, an appropriate amount of water is added, and the preparation is prepared by cooling under sealed conditions for 10 hours.

Embodiment 2

[0009] Example 2: Main components: diamond powder 71%, abrasive 2%, reset calcium carbonate 15%, silicon dioxide 12%, appropriate amount of water.

[0010] The preparation formula of the acid precision polishing liquid is characterized in that: the ingredients are evenly proportioned and stirred, an appropriate amount of water is added, and the preparation is prepared by cooling under sealed conditions for 15 hours.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides an acidic precision polishing solution preparing formula and especially provides the acidic precision polishing solution preparing formula used for polishing substrates of diamond accessories. An acidic precision polishing solution mainly includes following main components: 65-75% of diamond powder, 1-3% of an abradant, 11-16% of heavy calcium carbonate, 3-6% of silicon dioxide and a proper amount of water. The acidic precision polishing solution is precise in density, is large in friction ion particles, is hard in texture, can completely clean even a very small position, is free of contamination residue, is melt in smell and is not liable to leave a scratch.

Description

technical field [0001] The invention provides a preparation formula of an acid precision polishing liquid, in particular a preparation formula of an acid precision polishing liquid used for polishing a substrate of a gemstone ornament. Background technique [0002] With the rapid development of the jewelry industry, the demand for polishing agents for gemstone polishing is also increasing day by day. In the process of processing gemstones, they need to be polished and thinned, so there are strict requirements for polishing agents. Its production is rough, it is easy to leave scratches on the smooth gem surface and it is difficult to make up for it, causing huge economic losses to the merchants. [0003] In order to overcome the above problems, the present invention provides a preparation formula of an acid precision polishing liquid, which greatly solves the danger of uneven polished surface of gemstones and easy to cause scratches, and strives for perfection in the producti...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 李涛
Owner QINGDAO GUYU GRAPHITE
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products