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Eccentric compression type thin film sample holder

A sample holder and film technology, applied in ion implantation plating, metal material coating process, coating and other directions, can solve the problem of not being able to apply bias voltage and rotation at the same time, and achieve insulation problems, simple structure and convenient use. Effect

Inactive Publication Date: 2015-06-10
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In order to overcome the deficiency that the sample holder in the prior art cannot be biased and rotated at the same time, the present invention provides a biasable film sample holder, which can facilitate the loading of positive and negative biases on the sample holder of the magnetron sputtering coating machine

Method used

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  • Eccentric compression type thin film sample holder

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Embodiment 1

[0012] figure 1 It is a structural schematic diagram of the biasable film sample holder of the present invention. exist figure 1 Among them, the sample rack of the present invention includes a bracket 1, a bracket base 2, a metal bearing 3, a connecting rod 4 and a vacuum chamber base 5; the connection relationship is that the bracket 1 is fixedly connected to the bracket base 2, so The connecting rod 4 is arranged below the bracket base 2, one end of the connecting rod 4 is fixedly connected with the bracket 1, and the other end is fixedly connected with the vacuum chamber base 5; the inner ring of the metal bearing 3 is fixed on the connecting rod 4 , the outer ring is connected with the cable. The material of bracket 1 is polytetrafluoroethylene. In this way, the difficult problem of connecting the rotating bracket 1 and the electrode is solved, and the insulation problem of the electrode and the casing is also realized.

[0013] The bracket 1, the bracket base 2, the m...

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Abstract

The invention provides an eccentric compression type thin film sample holder, by means of the sample holder, it is facilitated that positive and negative eccentric compression is loaded to a magnetron sputtering film plating machine sample holder, and a sample can be rotated. The eccentric compression type thin film sample holder comprises a bracket, a bracket base, a metal bearing, a connecting rod and a vacuum chamber base. By utilizing the characters of the bearing, an inner ring of the metal bearing is fixed on the connecting rod of the bracket, meanwhile, an outer ring extracts an electrode, and the vacuum chamber base and the bracket base are separated from each other through the connecting rod. Therefore, the difficult problems of rotating the bracket and connecting the electrode are solved, and the insulation of the electrode and a machine case is achieved. By means of the eccentric compression type thin film sample holder, the bracket can be rotated, and meanwhile continuous eccentric compression can be applied to the bracket, the structure is simple, and the use is convenient.

Description

technical field [0001] The invention belongs to the technical field of preparation of thin film materials, and in particular relates to a biasable thin film sample holder, which can facilitate positive and negative bias loading on the sample holder of a magnetron sputtering coating machine. Background technique [0002] In the magnetron sputtering coating process, in order to improve the uniformity of film formation, the substrate can be rotated, that is, the substrate is placed on a rotating disk. At the same time, in order to improve the quality of film formation, increase the film deposition rate and enhance the film and The adhesion of the substrate can be biased to the substrate. However, if wires are used to directly connect the DC electrode to the substrate, the gears will break it during rotation, so that it cannot work normally. In order to solve this problem, we can improve the original sample holder to meet the needs of high-quality film formation. Contents of ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/50
CPCC23C14/505
Inventor 刘艳松何智兵王涛许华陈志梅李玉红
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
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